Skip to main content
SpringerLink
Log in

Negative Radiation Resists

  • Chapter
Semiconductor Lithography

Part of the book series: Microdevices ((MDPF))

  • 839 Accesses

Abstract

In Chapter 4, we discussed negative photoresist compositions and polymeric factors which affect resolution; in Chapter 3, we considered exposure tools and radiation chemistry principles; and in Chapter 10, we discuss the swelling of negative resists in a developer. These chapters form the principal backgrounds for the processing aspects of negative radiation resists.

This is a preview of subscription content, log in via an institution to check access.

Access this chapter

Log in via an institution
Chapter
USD 29.95
Price excludes VAT (USA)
  • Available as PDF
  • Read on any device
  • Instant download
  • Own it forever
eBook
USD 129.00
Price excludes VAT (USA)
  • Available as PDF
  • Read on any device
  • Instant download
  • Own it forever
Softcover Book
USD 169.99
Price excludes VAT (USA)
  • Compact, lightweight edition
  • Dispatched in 3 to 5 business days
  • Free shipping worldwide - see info

Tax calculation will be finalised at checkout

Purchases are for personal use only

Institutional subscriptions

Preview

Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.

References

  1. A. Reiser and E. Pitts, J. Photogr. Sci. 29, 187 (1981).

    Google Scholar 

  2. Y. Taniguchi, Y. Hatano, H. Shiraishi, S. Horigome, S. Nonogaki, and K. Navoaka, Jpn. J. Appl. Phys. 18, 1143 (1979).

    Google Scholar 

  3. P. Flory, Mechanics of Chain Polymers, Wiley, New York, 1969.

    Google Scholar 

  4. A. Charlesby, Atomic Radiation and Polymers, Pergamon Press, Elmsford, N.Y., 1960.

    Google Scholar 

  5. M. Nakase and Y. Matsumoto, Photogr. Sci. Eng. 23, 215 (1979).

    Google Scholar 

  6. G. Stevens, Microphotography, Wiley, New York, 1967, p. 24.

    Google Scholar 

  7. K. Okada, K. Suzuki, and J. Matsui, J. Electrochem. Soc. 130, 1947 (1983).

    Google Scholar 

  8. A. Shultz, J. Polym. Sci. 21, 325 (1956).

    Google Scholar 

  9. A. Chapiro, Radiation Chemistry of Polymeric Systems, Wiley, New York, 1962.

    Google Scholar 

  10. S. Bernachi and H. Smith, IEEE Trans. Electron Devices ED-22, 42 (1975).

    Google Scholar 

  11. G. Taylor, G. Coquin, and S. Somekh, Polym. Eng. Sci. 17, 420 (1977).

    Google Scholar 

  12. U. S. Patent 4,061,829 (1978), Bell.

    Google Scholar 

  13. G. Taylor, Solid State Technol May 1980, p. 73.

    Google Scholar 

  14. L. Thompson, E. Feit, M. Bowden, P. Llengza, and E. Spencer, J. Electrochem. Soc. 121, 1500 (1974).

    Google Scholar 

  15. G. Taylor and J. Moran, J. Vac. Sci. Technol. 16, 2014 (1979).

    Google Scholar 

  16. G. Taylor, T. Wolf, and M. Goldrick, J. Electrochem. Soc. 128, 361 (1981).

    Google Scholar 

  17. G. Taylor, T. Wolf, and J. Moran, J. Vac. Sci. Technol. 19, 872 (1981).

    Google Scholar 

  18. T. Yamaoka, T. Tsunoda, and Y. Goto, Photogr. Sci. Eng. 23, 196 (1979).

    Google Scholar 

  19. S. Imamura, S. Sugawara, and K. Murase, J. Electrochem. Soc. 124, 1139 (1977).

    Google Scholar 

  20. K. Murase, K. Kakuchi, and S. Sugawara, Proceedings of the International Conference on Microlithography, Paris, 1977, p. 261.

    Google Scholar 

  21. S. Imamura, J. Electrochem. Soc. 126, 1619 (1979).

    Google Scholar 

  22. S. Imamura and S. Sugawara, Jpn. J. Appl. Phys. 21, 776 (1982), J. Electrochem. Soc. 131, 1122 (1984).

    Google Scholar 

  23. Y. Saitoh, H. Hoshihara, and I. Watanabe, Jpn. J. Appl. Phys. 21, L52 (1982).

    Google Scholar 

  24. H. Shiraishi, Y. Tanaguchi, S. Horigome, and S. Nonogaki, Polym. Eng. Sci. 20, 1054 (1980).

    Google Scholar 

  25. D. Hofer, F. Kaufman, S. Kramer, and A. Aviram, Appl Phys. Lett. 37, 314 (1980).

    Google Scholar 

  26. J. Dubois and M. Gazard, Proc. 8th Electron, Ion Beam Sci. Technol., Electrochemical Society, 1978, p. 303.

    Google Scholar 

  27. R. Brault, Proc. 6th Int. Conf. Electron Ion Beams, Electrochemical Society, 1976, p. 63.

    Google Scholar 

  28. M. Okabe, Y. Kitamura, and Y. Furukawa, Proc. 10th Electron Ion Beam Sci., Electrochemical Society, 1982, p. 302.

    Google Scholar 

  29. K. Okada, Jpn. J. Appl. Phys. 20, L22 (1981).

    Google Scholar 

  30. P. Blais, C. Dixon, T. O’Keefe, J. Ostroski, T. Meek, and M. Picher, Electrochem. Soc. Ext. Abstr. 80, 835 (1980).

    Google Scholar 

  31. Z. Tan, C. Petropolous, and F. Rauner, J. Vac. Sci. Technol. 19, 1348 (1981).

    Google Scholar 

  32. U. S. Patent 3,770,433 (1973), Bell.

    Google Scholar 

  33. J. Moran and G. Taylor, J. Vac. Sci. Technol. 16, 2014–2020 (1979).

    Google Scholar 

  34. T. Tada, J. Electrochem. Soc. 129, 1070 (1982).

    Google Scholar 

  35. Y. Ohnishi, M. Itoh, K. Mizano, H. Gokan, and S. Fujiwara, J. Vac. Sci. Technol. 19, 1141 (1981).

    Google Scholar 

  36. T. Hall, A. Wagner, and L. Thompson, J. Vac. Sci. Technol. 16, 1889 (1979).

    Google Scholar 

  37. R. Brault and L. Miller, Polym. Eng. Sci. 20, 1064 (1980), 23, 941 (1983).

    Google Scholar 

  38. J. Lai and L. Shepard, J. Electrochem. Soc. 126, 696 (1979).

    Google Scholar 

  39. K. Itaya, K. Shibayama, and T. Fujimoto, J. Electrochem. Soc. 129, 663 (1982).

    Google Scholar 

  40. U. S. Patent 4,383,026 (1982), Bell.

    Google Scholar 

  41. K. Balasulbramanyam, L. Kapapiperis, C. Lee, and A. Ruoff, J. Vac. Sci. Technol. 19, 21 (1981), Microelectron. J. 14, 35 (1983).

    Google Scholar 

  42. U. S. Patent 4,377,437 (1983), Bell.

    Google Scholar 

  43. T. Venkatesan, G. Taylor, A. Wagner, B. Wilkens, and D. Barr, J. Vac. Sci. Technol. 19, 1379 (1981).

    Google Scholar 

  44. W. Brown, T. Venkatesan, and A. Wagner, Solid State Technol. Aug. 1981, p. 60.

    Google Scholar 

  45. E. Wolf, I. Aesida, L. Ratburn, and J. Chinn, J. Vac. Sci. Technol. 21, 661 (1982).

    Google Scholar 

  46. P. LaMarche, R. Levi-Setti, and Y. Wang, J. Vac. Sci. Technol. B1, 1056 (1983); H. Kuwano, J. Appl. Phys. 551, 1149 (1984).

    Google Scholar 

  47. I. Berry and A. Caviglia, J. Vac. Sci. Technol. B1, 1059 (1983).

    Google Scholar 

  48. H. Choong and F. Kahn, J. Vac. Sci. Technol. B1, 1066 (1983).

    Google Scholar 

  49. H. Choong and F. Kahn, J. Vac. Sci. Technol. 19, 1121 (1981).

    Google Scholar 

  50. Y. Kamoshida, M. Koshiba, H. Yoshimoto, Y. Hanta, and K. Harada, J. Vac. Sci. Technol. B1, 1156 (1983).

    Google Scholar 

  51. T. Tamamura, S. Imamura, O. Kogure, S. Sugawara, and K. Sukegawa, Am. Chem. Soc. Org. Coat. Appl. Polym. Sci. 48, 150 (1983).

    Google Scholar 

  52. P. Rissman, E. Liui, and G. Owen, J. Vac. Sci. Technol. B1, 1014 (1983).

    Google Scholar 

  53. J. Steelhammer and W. Wentworth, J. Chem. Phys. 51, 1802 (1969).

    Google Scholar 

  54. S. Imamura, T. Tamamura, K. Harada, and S. Sugawara, J. Appl. Polym. Sci. 27, 937 (1982).

    Google Scholar 

  55. J. Jagt and A. Seviriens, Polym. Eng. Sci. 20, 1082 (1980).

    Google Scholar 

  56. H. Shiraishi, Y. Tanaguchi, S. Horigome, and S. Nonogaki, Polym. Eng. Sci. 20, 1054 (1980).

    Google Scholar 

  57. Y. Yoneda, K. Kitamura, J. Naito, T. Kitakohji, H. Okuyama, and K. Murakawa, Polym. Eng. Sci. 20, 1110 (1980).

    Google Scholar 

  58. L. Thompson and E. Doerries, J. Electrochem. Soc. 126, 1699 (1978).

    Google Scholar 

  59. J. Liutkus, J. Shaw, M. Hatzakis, and J. Paraszczak, Polym. Eng. Sci. 23, 1047 (1983).

    Google Scholar 

  60. E. Feit and L. Stillwagon, Polym. Eng. Sci. 16, 1997 (1979).

    Google Scholar 

  61. E. Feit and L. Stillwagon, Polym. Eng. Sci. 20, 1058 (1980).

    Google Scholar 

  62. S. Inamura, J. Electrochem. Soc. 126, 1628 (1979).

    Google Scholar 

  63. U. S. Patent 4,286,049 (1982), Nippon.

    Google Scholar 

  64. K. Sukegawa, T. Tamamura, and S. Sugawara, J. Electrochem. Soc. 129, 1835 (1982); 10th Electron Ion Beam Conf., Electrochemical Society, 1982, p. 183.

    Google Scholar 

  65. L. Thompson, L. Stillwagon, and E. Doerries, J. Vac. Sci. Technol. 15, 940 (1978).

    Google Scholar 

  66. Y. Ohnishi, K. Tanigaki, and S. Fugawara, J. Vac. Sci. Technol. 19, 1136 (1981).

    Google Scholar 

  67. Y. Ohnishi, K. Tanigaki, and S. Fugawara, Am. Chem. Soc. Org. Coat. Appl. Polym. Sci. 48, 152 (1983).

    Google Scholar 

  68. U. S. Patent 4,426,439 (1984), Fujitsu.

    Google Scholar 

  69. H. Ku and L. Scala, J. Electrochem. Soc. 116, 980 (1969).

    Google Scholar 

  70. U. S. Patent 4,061,799 (1977), TL

    Google Scholar 

  71. U. S. Patent 3,916,035 (1975), TI.

    Google Scholar 

  72. U. S. Patents 4,130,424 (1978) and 4,262,081 (1981), Bell.

    Google Scholar 

  73. U. S. Patent 4,318,976 (1982), TI; J. Shy, Polym. Eng. Sci. 23, 980 (1983).

    Google Scholar 

  74. T. Tamamura, S. Imamura, K. Harada, and S. Sugawara, J. Electrochem. Soc. 129, 1831 (1982).

    Google Scholar 

  75. M. Morita, A. Tanaka, S. Imamura, T. Tamamura, and O. Kogure, Jpn. J. Appl. Phys. 22, L659 (1983).

    Google Scholar 

  76. T. Hirai, Y. Hatano, and S. Nonogaki, J. Electrochem. Soc. 118, 669 (1971).

    Google Scholar 

  77. L. Thompson, J. Ballantyne, and E. Feit, J. Vac. Sci. Technol. 12, 1280 (1975).

    Google Scholar 

  78. J. Bartelt and E. Feit, J. Electrochem. Soc. 122, 541 (1975).

    Google Scholar 

  79. Y. Taniguchi, Y. Hatano, H. Shiraishi, S. Horigome, S. Nonogagki, and K. Naroaka, Jpn. J. Appl. Phys. 18, 1143 (1979).

    Google Scholar 

  80. E. Feit, L. Thompson, C. Wilkins, M. Wurtz, E. Doerries, and L. Stillwagon, J. Vac. Sci. Technol. 16, 1997 (1979).

    Google Scholar 

  81. J. Dubois, A. Eranian, and E. Datamanic, Proc. 8th Electron, Ion Beam Sci. Technol., Electrochemical Society, 1978, p. 303.

    Google Scholar 

  82. J. Crivello and J. Lam, Polym. Eng. Sci. 23, 953 (1983), J. Polym. Sci. 17, 2877 (1979), U. S. Patents 4,256,828 (1981) and 4,102,687 (1978), GE.

    Google Scholar 

  83. U. S. Patents 4,090,936 (1978) and 4,256,828 (1981), 3M.

    Google Scholar 

  84. U. S. Patent 4,156,035 (1979), W. Grace.

    Google Scholar 

  85. S. Pappas and J. Jilek, Photogr. Sci. Eng. 23, 141 (1979).

    Google Scholar 

  86. S. Schlesinger, Polym. Eng. Sci. 14, 513 (1974).

    Google Scholar 

  87. Y. Ohnishi, M. Itoh, K. Mizuno, H. Gokan, and S. Fugawara, J. Vac. Sci. Technol. 19, 1141 (1981).

    Google Scholar 

  88. U. S. Patent 4,299,911 (1981), SOMAR.

    Google Scholar 

  89. U. S. Patent 3,627,599 (1971), RCA.

    Google Scholar 

  90. G. Paal, U. Strohle, and G. Keelhorn, J. Electrochem. Soc. 120, 1717 (1973).

    Google Scholar 

  91. U. S. Patent 4,289,824 (1981), Kodak.

    Google Scholar 

  92. Z. Tan, S. Georgia, C. Petropoulous, and F. Rauner, J. Vac. Sci. Technol. 19, 1348 (1981), Polym. Eng. Sci. 23, 931 (1983).

    Google Scholar 

  93. U. S. Patent 3,703,402 (1972), GE.

    Google Scholar 

  94. M. Cole, D. Skelley, and B. Wagner, IEEE Trans. Electron Devices ED-22, 417 (1975).

    Google Scholar 

  95. J. Bartelt, Am. Chem. Soc. Org. Coat. 33, 390 (1973).

    Google Scholar 

  96. U. S. Patent 4,267,258 (1981).

    Google Scholar 

  97. U. S. Patent 4,318,976 (1982), TL

    Google Scholar 

  98. K. Lee, W. Jensen, and P. Cukor, Am. Chem. Soc. Org. Coat. Prepr. 45, 143 (1981), SPIE Proc. 333, 15 (1982), U. S. Patent 4,456,678 (1984), GTE.

    Google Scholar 

  99. U. S. Patents 4,338,392 and 4,247,622, IBM.

    Google Scholar 

  100. D. Hofer, S. Kramer, F. Kaufman, and A. Avriam, Appl. Phys. Lett. 37, 314 (1980), 36, 423 (1980), 40, 90 (1982).

    Google Scholar 

  101. T. Yaniaka, T. Tsunodo, and Y. Goto, Photogr. Sci. Eng. 23, 196 (1979).

    Google Scholar 

  102. N. O. Gato, K. Saniu, C. Azuma, H. Tanaka, K. Oguchi, T. Nakida, and Y. Takakashi, J. Appl. Polym. Sci. 28, 699 (1983).

    Google Scholar 

  103. L. Thompson, E. Feit, and R. Heidenreich, Polym. Eng. Sci. 14, 529 (1974).

    Google Scholar 

  104. E. Roberts, Third Electron Ion Beam Conf., Electrochemical Society, 1968, p. 571.

    Google Scholar 

  105. E. Roberts, J. Electrochem. Soc. 120, 716 (1973).

    Google Scholar 

  106. Y. Yatsui, T Nakato, and K. Umehara, J. Electrochem. Soc. 116, 94 (1969).

    Google Scholar 

  107. M. Gazard, Am. Chem. Soc. Org. Coat. 33, 372 (1973).

    Google Scholar 

  108. J. Dubois and M. Gazard, Electrochem. Soc. Ext. Abstr. 72-1, 127 (1972).

    Google Scholar 

  109. U. S. Patents 3,236,707 and 3,222,670 (1966).

    Google Scholar 

  110. J. Paraszczak, D. Kern, J. Bucchignano, E. Arthur, and M. Rosenfield, J. Vac. Sci. Technol. B1, 1372 (1983).

    Google Scholar 

  111. V. Korchov, T. Martynova, and V. Danilovich, Thin Solid Films 101, 369 (1983).

    Google Scholar 

  112. U. S. Patent 4,301,231 (1981), Toray.

    Google Scholar 

  113. U. S. Patent 4,237,208 (1980), RCA.

    Google Scholar 

  114. N. Atoda and H. Kawakatsu, J. Electrochem. Soc. 123, 1519 (1976).

    Google Scholar 

  115. U. S. Patent 4,197,332 (1980), IBM.

    Google Scholar 

  116. U. S. Patent 3,296,126 (1967), GE.

    Google Scholar 

  117. U. S. Patent 3,516,764 (1970), U.S. Army.

    Google Scholar 

  118. U. S. Patent 3,872,940 (1972), Dai Kokyo.

    Google Scholar 

  119. J. Shaw, M. Hatzakis, and J. Liutkus, RETEC SPE Photopolymers, Ellenville. N.Y., 1982, p. 285; Polym. Eng. Sci. 23, 1054 (1983).

    Google Scholar 

  120. J. Paraszczak, J. Shaw, M. Hatzakis, E. Babich, and F. Arthur, SPIE Proc. 393, 57 (1983).

    Google Scholar 

  121. M. Monta, S. Imamura, T. Tamamura, O. Kogure, and K. Murase, J. Vac. Sci. Technol. B1, 1171 (1983).

    Google Scholar 

  122. A. Barraud, C. Rossilo, and A. Ruaudel-Teixier, J. Vac. Sci. Technol. 16, 2003 (1979), Thin Solid Films 68, 99 (1980), U. S. Patent 4,235,958 (1980).

    Google Scholar 

  123. J. Krasewski and R. Gabrys, J. Appl. Polym. Sci. 25, 1131 (1980).

    Google Scholar 

  124. B. Singh, S. Beaumont, A. Webb, P. Bower, and C. Wilkinson, J. Vac. Sci. Technol. B1, 1174 (1983).

    Google Scholar 

  125. A. Shepp, G. Goldberg, and J. Lavine, IEEE Electron Devices Lett. EDL-1, 61 (1980), SPIE Proc. 393, 34 (1983).

    Google Scholar 

  126. M. Babu and T. Ikeda, Jpn. J. Appi Phys. 20, L149 (1981).

    Google Scholar 

  127. R. Thornley and T. Sun, J. Electrochem. Soc. 112, 1151 (1965).

    Google Scholar 

  128. B. Broyde, J. Electrochem. Soc. 16, 1241 (1969).

    Google Scholar 

  129. R. Heidenreich, L. Thompson, E. Feit, and G Melliar-Smith, J. Appl. Phys. 44, 4039 (1973).

    Google Scholar 

  130. W. Stickel and G. Langer, J. Vac. Sci. Technol. B1, 1008 (1983).

    Google Scholar 

  131. T. Chang, J. Vac. Sci. Technol. 12, 1271 (1975).

    Google Scholar 

  132. M. Nakase and Y. Natsumoto, Photogr. Sci. Eng. 23, 215 (1979).

    Google Scholar 

  133. K. Kanaya and H. Yamazaki, Optik (Stuttgart) 25, 474 (1967).

    Google Scholar 

  134. S. Schiller and M. Newman, Third Int. Conf. Electron Ion Beam, Electrochemical Society, 1968, p-481.

    Google Scholar 

  135. R. Heidenreich and L. Thompson, Appl. Phys. Lett. 22, 279 (1973).

    Google Scholar 

  136. P. Vettiger, T. Forester, and D. Kern, J. Vac. Sci. Technol. B1, 1378 (1983).

    Google Scholar 

  137. T. Kitayama, Jpn. Semicond. Technol. News 2, 6 (1983).

    Google Scholar 

  138. S. Neustrolov and E. Sokolov, Russ. Chem. Rev. 41, 795 (1972).

    Google Scholar 

  139. N. Nakayama, Y. Machida, S. Furiya, S. Yamamoto, and T. Hitsatsugu, Eighth Int. Conf. Electron, Ion, and Photon Beams, Electrochemical Society, 1978, p. 252; Electrochem. Soc. Ext. Abstr. 82-1, 509 (1982).

    Google Scholar 

  140. B. Lin, J. Vac. Sci. Technol. 12, 1289 (1975), 12, 1284 (1975).

    Google Scholar 

  141. H. Nakata, T. Kato, A. Murata, Y. Hirai, and K. Nagami, J. Vac. Sci. Technol. 19, 1248 (1981).

    Google Scholar 

  142. P. Shah, G. Pollack, R. Miller, G. Varnell, U. Lee, R. Love, S. Wood, and R. Robbins, J. Vac. Sci. Technol. 19, 905 (1981).

    Google Scholar 

  143. G. Varnell and P. Shah, Proc. IEEE 71, 612 (1983).

    Google Scholar 

  144. Y. Watakale, T. Kato, A. Shigetomi, and H. Morimoto, J. Vac. Sci. Technol. 21, 1005 (1982).

    Google Scholar 

  145. S. Fok and G. Hong, Proc. 1983 Kodak Microelectronic Seminar, San Diego, p. 159.

    Google Scholar 

  146. G. Martel and W. Thompson, Semicond. Int. Jan. 1979, p. 78.

    Google Scholar 

  147. M. Inoue, Jpn. Electron. Eng. May 1982, p. 61.

    Google Scholar 

  148. T. Berker and D. Casey, IEEE Trans. Electron Devices ED-29, 524 (1982).

    Google Scholar 

  149. U. S. Patents 3,046,125, 3,042,516, 3,042,518, Horizons.

    Google Scholar 

  150. M. Gazard, A. Chapiro, J. Dubois, and G Duchesne, Polym. Eng. Sci 20, 1069 (1980).

    Google Scholar 

  151. A. Novembre and M. Bowden, Polym. Eng. Sci. 23, 975 (1983).

    Google Scholar 

  152. J. Shaw, M. Hatzakis, E. Babich, and J. Liutkus, Polym. Eng. Sci. 23, 1047 (1983).

    Google Scholar 

  153. G. Taylor, T. Wolf, and L. Stillwagon, Solid State Technol. Feb. 1984, p. 145.

    Google Scholar 

  154. M. Suzuki, K. Sargo, H. Gokan, and Y. Ohnishi, J. Electrochem. Soc. 130, 1962 (1983).

    Google Scholar 

  155. W. Liu, J. Corelli, A. Steckl, J. Moore, and J. Silverman, Appl. Phys. Lett. 44, 973 (1984).

    Google Scholar 

  156. S. Imamura, T. Tamamura, K. Sukegawa, O. Kogure, and S. Sugawara, J. Electrochem. Soc. 131, 1122 (1984).

    Google Scholar 

  157. Japanese Patent 58,16,234, Chem. Abstr. 101, 15307 (1984).

    Google Scholar 

  158. K. Tanigaki, Y. Ohnishi, and S. Fugawara, Am. Chem. Soc. Symp. Ser. 242, 177 (1983).

    Google Scholar 

  159. P. Whipps, in Microcircuit Engineering, edited by J. Cleaver, H. Ahmed, and G. Jones, Academic Press, New York, 1984, p. 279.

    Google Scholar 

  160. M. Morita, S. Imamura, T. Tamamura, O. Kogure, and R. Murase, J. Electrochem. Soc. 131, 653 (1984).

    Google Scholar 

  161. M. Morita, S. Imamura, T. Tamamura, O. Kogure, and R. Murase, J. Electrochem. Soc. 131, 2402 (1984).

    Google Scholar 

  162. J. Lane, SPIE Proc. 448, 119 (1984).

    Google Scholar 

  163. C Rosilla, A. Rosilla, and F. Buiguez, Microelectron. Eng. 1, 197 (1983).

    Google Scholar 

  164. Japanese Patent 58,105,140 (1983), Chem. Abstr. 101, 120489 (1983).

    Google Scholar 

  165. M. Tsunooka, T. Ueda, and M. Tanaka, J. Polym. Sci. 22, 2217 (1984).

    Google Scholar 

  166. Y. Tabata, S. Tagawa, and M. Washio, in Materials for Microlithography, edited by L. Thompson, C Willson, and J. Frechet, Am. Chem. Soc. Symp. Ser. 266, 151 (1984).

    Google Scholar 

  167. R. Taracson. M. Hartney, and M. Bowden, Am. Chem. Soc. Symp. Ser. 266, 361 (1984).

    Google Scholar 

  168. A. Ledwith, M. Mills, P. Hendy, A. Brown, S. Clements, and R. Moody, J. Vac. Sci. Technol. B3, 373 (1985).

    Google Scholar 

  169. M. Hartney, R. Tarascon, and A. Novembre, J. Vac. Sci. Technol. B3, 360 (1985).

    Google Scholar 

  170. F. Lin, B. Gong, Y. Ye, and C. Ku, J. Vac. Sci. Technol. B3, 373 (1985).

    Google Scholar 

  171. U. S. Patent 4,508,813 (1985), Fujitsu.

    Google Scholar 

  172. U. S. Patent 4,513,076 (1985), GAF.

    Google Scholar 

  173. C. Lewis, J. Polym. Sci. 21, 1543 (1983), U. S. Patent 4,517,276 (1985), Varian.

    Google Scholar 

  174. German Patent 3,414,104, Chem. Abstr. 102, 87568 (1984).

    Google Scholar 

  175. Japanese Patent 59,146,047, Chem. Abstr. 102, 70253 (1984).

    Google Scholar 

  176. T. Ueno, H. Shiraishi, T. Twayangi, and S. Nonogaki, J. Electrochem. Soc. 132, 1168 (1985).

    Google Scholar 

  177. M. Hartney and A. Novembre, SPIE Advances in Resist Technology and Processing 539, 90 (1985); SPE RETEC Photopolymer, Ellenville, N.Y., 1985, p. 211.

    Google Scholar 

  178. R. Brault, R. Kubena, and R. Metzger, SPIE Advances in Resist Technology and Processing 539, 70 (1985).

    Google Scholar 

  179. R. Daly, M. Hanrahan, and R. Blevins, SP IE Advances in Resist Technology and Processing 539, 138 (1985).

    Google Scholar 

  180. M. Toukhy, SPIE Advances in Resist Technology and Processing 539, 131 (1985).

    Google Scholar 

  181. Y. Ohnishi, M. Suzuki, K. Saigo, Y. Satome, and H. Gokan, SPIE Advances in Resist Technology and Processing 539, 62 (1985), J. Electrochem. Soc. 133, 977 (1986).

    Google Scholar 

  182. H. Gokan, Y. Saotome, K. Saigo, M. Suzuki, and Y. Ohnishi, J. Electrochem. Soc. 132, 909 (1985).

    Google Scholar 

  183. S. Imamura, T. Tamamura, and O. Kogure, Polym. J. 16, 441 (1984).

    Google Scholar 

  184. U. S. Patent 4,508,813 (1985), Fujitsu.

    Google Scholar 

  185. K. Okada and J. Matsui, Jpn. J. Appl. Phys. 24, 772 (1985).

    Google Scholar 

  186. U. S. Patent 4,474,869 (1984), Hughes; 4,587,203 (1986).

    Google Scholar 

  187. Y. Suzuki, J. Vac. Sci. Technol. B3, 1009 (1985).

    Google Scholar 

  188. U. S. Patent 4,535,054 (1985).

    Google Scholar 

  189. Japanese Patent 60,15,636, Maruzen; Chem. Abstr. 102, 212703 (1985).

    Google Scholar 

  190. Japanese Patent 60,80,852, NTT; Chem. Abstr. 103, 79513 (1985).

    Google Scholar 

  191. Y. Suzuki, Solid State Technol. 28(5), 197 (1985).

    Google Scholar 

  192. K. Tanigaki, M. Suzuki, Y. Saotome, Y. Ohnishi, and K. Tateishi, J. Electrochem. Soc. 132, 1678 (1985).

    Google Scholar 

  193. K. Tanigaki, M. Suzuki, and Y. Ohnishi, J. Vac. Sci. Technol. B3, 1594 (1985).

    Google Scholar 

  194. U. S. Patent 4,456,678 (1985), GTE.

    Google Scholar 

Download references

Author information

Authors and Affiliations

  1. General Technology Division, International Business Machines Corporation, Hopewell Junction, New York, USA

    Wayne M. Moreau

Authors
  1. Wayne M. Moreau
    View author publications

    You can also search for this author in PubMed Google Scholar

Rights and permissions

Reprints and permissions

Copyright information

© 1988 Plenum Press, New York

About this chapter

Cite this chapter

Moreau, W.M. (1988). Negative Radiation Resists. In: Semiconductor Lithography. Microdevices. Springer, Boston, MA. https://doi.org/10.1007/978-1-4613-0885-0_5

Download citation

  • DOI: https://doi.org/10.1007/978-1-4613-0885-0_5

  • Publisher Name: Springer, Boston, MA

  • Print ISBN: 978-1-4612-8228-0

  • Online ISBN: 978-1-4613-0885-0

  • eBook Packages: Springer Book Archive

Publish with us

Policies and ethics

Search

Navigation