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Negative Radiation Resists

  • Wayne M. Moreau
Part of the Microdevices book series (MDPF)

Abstract

In Chapter 4, we discussed negative photoresist compositions and polymeric factors which affect resolution; in Chapter 3, we considered exposure tools and radiation chemistry principles; and in Chapter 10, we discuss the swelling of negative resists in a developer. These chapters form the principal backgrounds for the processing aspects of negative radiation resists.

Keywords

Modulation Transfer Function Proximity Effect Electrochemical Society Image Layer Negative Radiation 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Plenum Press, New York 1988

Authors and Affiliations

  • Wayne M. Moreau
    • 1
  1. 1.General Technology DivisionInternational Business Machines CorporationNew YorkUSA

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