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Summary and Future Processes

  • Wayne M. Moreau
Part of the Microdevices book series (MDPF)

Abstract

In this chapter I would like to restate the significant materials and processes which have aided the progress of semiconductor lithography. I shall also project into the future with processes for the next decade of submicrometer technology.

Keywords

Lithographic Process Image Layer Material Safety Data Sheet Negative Photoresist Positive Photoresist 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Plenum Press, New York 1988

Authors and Affiliations

  • Wayne M. Moreau
    • 1
  1. 1.General Technology DivisionInternational Business Machines CorporationNew YorkUSA

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