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Developing Resist Images

  • Chapter
Semiconductor Lithography

Part of the book series: Microdevices ((MDPF))

Abstract

The exposure process induces chemical changes in polymers such as random scission or cross-linking and molecular rearrangements in small molecules added to polymers. The chemical products are distinguished from the unexposed reactants by a developer or process of development (such as heating) which attempts to maximize the readout:

$$\textup{Developing readout} = \frac{\textup{Exposed resist properties}}{\textup{Unexposed resist properties}}$$

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    Wayne M. Moreau

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Moreau, W.M. (1988). Developing Resist Images. In: Semiconductor Lithography. Microdevices. Springer, Boston, MA. https://doi.org/10.1007/978-1-4613-0885-0_10

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