Determination of Composition and Ionicity by Critical Voltage and Other Electron Diffraction Methods

  • J. Gjønnes
  • H. Matsuhata
  • K. Gjønnes
Part of the NATO ASI Series book series (NSSB, volume 203)


Several methods for determination of structure factors/structure parameters by convergent beam electron diffraction (CBED) can be described in terms of the gap, (ϒji)min, at the dispersion surface. Most accurate may be those based upon measurement of the condition for zero gap, revaled by zero contrast of a Kikuchi or Kossel line. By measurement in non-systematic cases, measured either as a critical voltage or as a diffraction condition, the scope of the method is increased. Application of non-systematical critical voltage measurement to various types of semiconductor structures: ZnS, diamond, rutile type is shown.


Acta Cryst Bloch Wave Critical Voltage Dispersion Surface Convergent bealJl Electron Diffraction 
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Copyright information

© Plenum Press, New York 1989

Authors and Affiliations

  • J. Gjønnes
    • 1
  • H. Matsuhata
    • 1
    • 2
  • K. Gjønnes
    • 1
  1. 1.Department of PhysicsUniversity of OsloBlindern, OsloNorway
  2. 2.Toyota Technological InstituteTempaku, NagoyaJapan

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