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Convergent Beam Electron Diffraction Studies of Defects, Strains and Composition Profiles in Semiconductors

  • D. Cherns
Part of the NATO ASI Series book series (NSSB, volume 203)

Summary

This paper shows how convergent beam electron diffraction has been used at Bristol to study strains, defects and composition profiles in plan-view semiconductor multilayers. It is shown that epitaxial strains in bicrystals and multilayers can be measured down to ~ 0.1% and that varying strain fields near dislocations and interfaces can be investigated with high sensitivity. It is also shown that convergent beam diffraction gives a powerful new method of examining superlattice reflections from both periodic and irregular multilayer structures and studies of single quantum well samples of AlGaAs/GaAs and InP/InGaAs, which give well thicknesses to near monolayer precision, are also described.

Keywords

Misfit Dislocation Composition Profile Superlattice Reflection Convergent Beam Electron Diffraction Super Lattice 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Plenum Press, New York 1989

Authors and Affiliations

  • D. Cherns
    • 1
  1. 1.H.H. Wills Physics LaboratoryUniversity of BristolBristolUK

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