Electronic Structure and Fermi Level Pinning Obtained with Spatially Resolved Electron Energy Loss Scattering

  • P. E. Batson
Conference paper
Part of the NATO ASI Series book series (NSSB, volume 203)


The electron microscope has made great strides towards obtaining direct structural images of buried defects and interfaces in metals and semi-conductors. In principle, electronic structure may also be obtained directly from the same areas by observing the electron energy loss scattering. Currently at IBM, the high resolution electron spectrometer on the HB501 scanning transmission electron microscope (STEM) is producing core loss spectra which show directly changes in electronic structure at defects and interfaces. This report describes briefly the basis for the technique, and an application to the Al/Si(111) interface. At this interface, new electronic states appear within the Si gap and the Si conduction bandstructure a few eV above the conduction band minimum is modified. These modifications are intimately related to the establishment of the Schottky Barrier, allowing a direct measurement of the local pinning of the Fermi level.


Scanning Transmission Electron Microscope Conduction Band Minimum Spin Orbit Splitting Atom Column Incident Beam Direction 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.


Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.


  1. 1.
    P.E. Batson, Rev. Sci. Instrum. 57 (1986) 43.CrossRefGoogle Scholar
  2. 2.
    P.E. Batson, Rev. Sci. Instrum. 59 (1988) 1132.CrossRefGoogle Scholar
  3. 3.
    F.C. Brown and O. Rustgi, Phys. Rev. Lett. 28 (1972) 497.CrossRefGoogle Scholar
  4. 4.
    J.R. Chelikowski and M.L. Cohen, Phys. Rev. B10 (1974) 5095.Google Scholar
  5. 5.
    M. Altarelli and D.L. Dexter, Phys. Rev. Lett. 29 (1972) 1100.CrossRefGoogle Scholar
  6. 6.
    X. Weng, O.L. Sankey and P.Rez, Proc. 46th E.M.S.A., (ed. Bailey, San Fransisco Press, 1988), p. 506.Google Scholar
  7. 7.
    P.E. Batson, K.L. Kavanagh, J.M. Woodall, and J.W. Mayer, Phys. Rev. Lett. 57 (1986) 2729.PubMedCrossRefGoogle Scholar
  8. 8.
    R.F. Loane, Proc. 46th E.M.S.A., (ed. Bailey, San Fransisco Press, 1988), p. 820.Google Scholar
  9. 9.
    P.B. Hirsch, A. Howie, R.B. Nicholson, D.W. Pashley, and M.J. Whelan, “Electron Microscopy of Crystals, ” (London, Butterworths, 1965), p. 215.Google Scholar
  10. 10.
    P.E. Batson, Ultramicroscopy, in press.Google Scholar
  11. 11.
    S.G. Louie and M.L. Cohen, Phys. Rev. B13 (1976) 2461.Google Scholar
  12. 12.
    J. Tersoff, J. Vac. Sci. Tech. B3 (1985) 1157.Google Scholar
  13. 13.
    M. Wittmer, private communication.Google Scholar

Copyright information

© Plenum Press, New York 1989

Authors and Affiliations

  • P. E. Batson
    • 1
  1. 1.IBM Thomas J. Watson Research CenterYorktown HeightsUSA

Personalised recommendations