Summary
When a thyristor is in the forward-conducting state, all device junctions are forward biased and the device presents a minimum resistance to the forward current flow. At moderate and high injection levels, two of the three forward-biased junctions usually exhibit nearly equal but opposite potentials. Consequently, one junction contributes to the total device voltage drop. Since the junction voltage is a logarithmic function of the current, it varies only very slowly and its value is typically 0.8 to 1.0 V. for moderate or high current levels.
All regions of the device between the junctions, as well as metal contacts, contribute to the voltage drop across the device, but the most significant drop usually occurs in the long n base. This voltage drop is a sensitive function of the minority carrier lifetime in the n base, base width, and current density. At very high current densities the voltage drop consists basically of three components: the junction voltage drop, the n-base voltage drop, and the ohmic contact drop. At the extremely high currents, because of the injected carriers’ effect on mobility and lifetime, the voltage drop in the long base may also show an ohmic behavior.
Access this chapter
Tax calculation will be finalised at checkout
Purchases are for personal use only
Preview
Unable to display preview. Download preview PDF.
References
A. K. Jonscher. PNPN switching diodes. J. Electron. Control, 3: 573–586, 1957.
V. A. Kuz’min. Volt-ampere characteristics of p-n-p-n type semi-conductor devices in the “on” condition. Radio Engrg. Electron. Phys., 8: 150–156, 1963.
J. L. Moll, M. Tanenbaum, J. M. Goldey, and N. Holonyak, Jr. P-N-P-N transistor switches. Proc. IRE, 44: 1174–1182, 1956.
A. Herlet and K. Raithel. Forward characteristics of thyristors. Solid State Electron., 9: 1089–1105, 1966.
R. N. Hall. Power rectifiers and transistors. Proc. IRE, 40: 1512–1518, 1956.
N. H. Fletcher. The high current limit for semiconductor junction devices. Proc. IRE, 45: 862–872, 1957.
N. R. Howard and G. W. Johnson. P+IN+ silicon diodes at high forward current densities. Solid State Electron., 8: 275–284, 1967.
A. Herlet. The forward characteristic of silicon power rectifiers at high current densities. Solid State Electron., 11: 717–742, 1968.
J. Shields. The forward characteristics of p+-n-n+ diodes in theory and experiment. Proc. IEE, Part B, 106: 342, 1959.
E. Spenke. Notes on the theory of the forward characteristic of power rectifiers. Solid State Electron., 11: 1119–1130, 1968.
Y. C. Kao and D. R. Muss. Analytical design theory for high voltage PIN rectifiers. Solid State Electron., 13: 825–841, 1970.
S. C. Choo. Theory of a forward biased diffused junction P-L-N rectifier. IEEE Trans. Electron Devices, ED-20: 418–426, 1973.
S. C. Choo. Analytical approximation for an abupt PN junction and high-level condition. Solid State Electron., 16: 793–799, 1973.
J. Burtscher, F. Danhauser, and J. Krausse. Die Rekombination in Thyristoren und Gleichrichtern aus Silizium: Ihr Einfluss auf die Durchlasskennlinre und das Freiwerdezeitverhalten. Solid State Electron., 18: 35–63, 1975.
R. A. Kokosa. The potential and carrier distribution of a PNPN device in the on-state. Proc. IEEE, 55 (8): 1389–1400, 1967.
J. Cornu and M. Lietz. Numerical investigation of the thyristor forward characteristic. IEEE Trans. Electron Devices, ED-19 (8): 975–981, 1972.
M. Otsuka. The forward characteristics of a thyristor. Proc. IEEE, 55 (8): 1400–1408, 1967.
W. E. Newell. A design tradeoff relationship between thyristor ratings. PESC: 294–304, 1974.
T. Matsuzawa. Pulse current capability of high-speed thyristors. Electrical Engineering in Japan, 94 (1), 1974. [Translated from Denki Gakkai Ronbunshi, 94C, (1): 8–17, 1974.]
A. Rose. Comparative anatomy of models for double injection of electron and holes into solids. J. Appl. Phys., 35 (9): 2664–2678, 1964.
M. A. Lampert and R. B. Schilling. Current injection in solids: The regional approximation method. Semiconductors and Semimetals, Vol. 6. New York: Academic Press, 1970.
A. Blicher. The effect of the Auger recombination on the forward drop. RCA, Somerville, N.J., private communication, 1973.
J. D. Beck and R. Conradt. Auger recombination in Si. Solid-State Commun., 13: 93–95, 1973.
W. W. Sheng. The effect of Auger recombination on the emitter injection efficiency of bipolar transistors. IEEE Trans., ED-22: 25–27, 1975.
H. J. J. DeMan. The influence of heavy doping on the emitter of a bipolar transistor. IEEE Trans., ED-18 (10): 833–835, 1971.
R. P. Mertens, H. J. DeMan, and J. J. VanOverstraeten. Calculation of the emitter efficiency of bipolar transistors. IEEE Trans. Electron Devices, ED-20 (9): 772–778, 1973.
J. M. Assour and J. R. Bender. The forward characteristic of an SCR under high injection. RCA, private communication, 1974.
Author information
Authors and Affiliations
Rights and permissions
Copyright information
© 1976 Springer-Verlag New York Inc.
About this chapter
Cite this chapter
Blicher, A. (1976). Thyristor voltage drop in the on-state. In: Thyristor Physics. Applied Physics and Engineering, vol 12. Springer, New York, NY. https://doi.org/10.1007/978-1-4612-9877-9_7
Download citation
DOI: https://doi.org/10.1007/978-1-4612-9877-9_7
Publisher Name: Springer, New York, NY
Print ISBN: 978-1-4612-9879-3
Online ISBN: 978-1-4612-9877-9
eBook Packages: Springer Book Archive