Skip to main content

Planar-junction avalanche breakdown improvement

  • Chapter
Thyristor Physics

Part of the book series: Applied Physics and Engineering ((APPLIED PHYS,volume 12))

  • 282 Accesses

Summary

Planar junctions are much easier to passivate and to protect from external contaminants than are etched mesa devices. They compare unfavorably, however, with the mesa-type structures from the breakdown voltage point of view if special designs which include guard rings, field-limiting rings, or field plates are not used. When they are used, though, planar-junction breakdowns as good or better than those of mesa devices can be achieved.

This is a preview of subscription content, log in via an institution to check access.

Access this chapter

Chapter
USD 29.95
Price excludes VAT (USA)
  • Available as PDF
  • Read on any device
  • Instant download
  • Own it forever
eBook
USD 39.99
Price excludes VAT (USA)
  • Available as PDF
  • Read on any device
  • Instant download
  • Own it forever
Softcover Book
USD 54.99
Price excludes VAT (USA)
  • Compact, lightweight edition
  • Dispatched in 3 to 5 business days
  • Free shipping worldwide - see info

Tax calculation will be finalised at checkout

Purchases are for personal use only

Institutional subscriptions

Preview

Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.

References

  1. S. M. Sze and G. Gibbons. Effect of junction curvature on breakdown voltages in semiconductors. Solid State Electron., 9: 831, 1966.

    Article  ADS  Google Scholar 

  2. O. Leistiko, Jr. and A. S. Grove. Breakdown voltage of planar silicon junctions. Solid State Electron., 9: 847–852, 1966.

    Article  ADS  Google Scholar 

  3. V. A. K. Temple and M. S. Adler. Calculation of the diffusion curvature related avalanche breakdown in high voltage planar p-n junctions. IEEE Trans. Electron Devices, ED-22: 910–916, 1975.

    Article  Google Scholar 

  4. D. S. Zoroglu and L. E. Clark. Design considerations for high voltage overlay annular diodes. IEEE Trans. Electron Devices, ED-19 (1): 4–8, 1972.

    Article  Google Scholar 

  5. L. E. Clark and D. S. Zoroglu. Enhancement of breakdown properties of overlay annular diodes by field shaping resistive films. Solid State Electronics., 15: 653–657, 1972.

    Article  ADS  Google Scholar 

  6. T. Aoki, T. Matsushita, H. Yamoto, H. Hayashi, M. Okayama, and Y. Kawana. Oxygen-doped polycrystalline silicon films applied to surface passivation. J. Electrochem. Soc. Technical Digest, March 1975, pp. 167–170.

    Google Scholar 

  7. G. Spaden and P. L. Hower. A new high voltage planar transistor technology. International Electron Device Meeting, Washington, D.C., October 1971.

    Google Scholar 

  8. E. Muñoz, J. M. Boix, J. Liabrés, J. P. Honico, and P. Piqueras. Electronic properties of undoped polycrystalline silicon. Solid State Electron., 17: 439–446, 1974.

    Article  ADS  Google Scholar 

  9. T. Matsushita, T. Aoki, T. Otsu, H. Yomoto, H. Hayashi, M. Okayama, and Y. Kawana. Highly reliable high voltage transistors by use of the Sipos process. IEDM Technical Digest, Washington, December 1975, pp. 167–170.

    Google Scholar 

  10. Y. C. Kao and E. D. Wolley. High-voltage planar p-n junctions. Proc. IEEE, 55 (8): 1409–1414, 1957.

    Article  Google Scholar 

  11. C. T. Sah, R. N. Noyce, and W. Shockley. Carrier generation and recombination in p-n junction characteristics. Proc. IRE, 45: 1228–1243, 1957.

    Article  Google Scholar 

  12. M. S. Adler and A. P. Ferro. Field calculations of planar diffused semi-conductor field limiting rings. IEDM, December 1973.

    Google Scholar 

  13. R. L. Davies and F. E. Gentry. Control of electric field at the surface of p-n junctions. IEEE Trans. Electron Devices, ED-11: 313–323, 1964.

    Article  Google Scholar 

  14. J. Cornu. Field distribution near the surface of beveled p-n junctions in high voltage devices. IEEE Trans. Electron Devices, ED-20: 347, 1973.

    Article  Google Scholar 

  15. T. Matsushita, H. Hayashi, and H. Yagi. New semiconductor devices of ultra-high breakdown voltage. IEDM, December 1973.

    Google Scholar 

Download references

Author information

Authors and Affiliations

Authors

Rights and permissions

Reprints and permissions

Copyright information

© 1976 Springer-Verlag New York Inc.

About this chapter

Cite this chapter

Blicher, A. (1976). Planar-junction avalanche breakdown improvement. In: Thyristor Physics. Applied Physics and Engineering, vol 12. Springer, New York, NY. https://doi.org/10.1007/978-1-4612-9877-9_15

Download citation

  • DOI: https://doi.org/10.1007/978-1-4612-9877-9_15

  • Publisher Name: Springer, New York, NY

  • Print ISBN: 978-1-4612-9879-3

  • Online ISBN: 978-1-4612-9877-9

  • eBook Packages: Springer Book Archive

Publish with us

Policies and ethics