Abstract
In this chapter we study the problem of impedance matching, within the context of its industrial application. Impedance matching is performed in order to maximize power transfer in a circuit and minimize reflection from the load. The process can be computationally complex, especially when the circuit is large and contains interconnected subsystems. In this chapter we examine the application of extremum seeking control to solve the impedance matching problem in a semiconductor plasma processing chamber system. In particular, we present two tuning algorithms applied to a radio frequency (RF) matching network design for a capacitive coupled plasma (CCP) chamber: one has the objective of improving the productivity by providing a tuning algorithm to give the user an optimized preset for each particular recipe; another one is a real time auto-tuning algorithm. We show experimental results for these two algorithms obtained by one of the authors (Zhang) at Applied Materials.
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Notes
- 1.
A process recipe is a predefined chamber operation conditions, such as gas mixture amount, chamber pressure, temperature and RF power, etc.
- 2.
Direct search is used here as a valid optimization method for NOESC because its behavior and properties are similar to those of derivative-free trust region methods. Moreover, since we rely on an already existing motor controller, all stability, convergence and robustness results from Chaps. 4 and 5 directly apply here.
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Zhang, C., Ordóñez, R. (2012). Impedance Matching in Semiconductor Plasma Processing Chamber. In: Extremum-Seeking Control and Applications. Advances in Industrial Control. Springer, London. https://doi.org/10.1007/978-1-4471-2224-1_7
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DOI: https://doi.org/10.1007/978-1-4471-2224-1_7
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