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Constraints and Challenges in Tip-Based Nanofabrication

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Tip-Based Nanofabrication

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Abstract

In the past decade, tip-based nanofabrication (TBN) has become a powerful technology for nanofabrication due to its low cost and unique atomic-level manipulation capabilities. While a wide range of nanoscale components, devices, and systems have been fabricated by TBN, this technology still faces a number of constraints and challenges, which can be categorized into three areas: repeatability (reliability), ability (feasibility), and productivity (throughput). This chapter reviews these constraints and discusses the challenges for potential approaches to circumventing them. First, the major TBN techniques and their recent advances are reviewed in brief. Then, specific approaches for enhancing its repeatability by using automated equipment, for increasing its ability by seeking strategies to create truly three-dimensional nanostructures, and for improving its productivity by parallel processing, speed increasing, and larger tips, are evaluated. Finally, a preliminary roadmap for the next several years and a recommendation of areas for future research and development are provided.

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Abbreviations

AFM:

Atomic force microscope/microscopy

AM:

Atomic manipulation

APTS:

Aminopropyl trimethoxysilane

BPL:

Beam pen lithography

CAD/CAM:

Computer-aided design/computer-aided manufacturing

CNC:

Computer numerical control

DNA:

Deoxyribonucleic acid

DPN:

Dip-pen nanolithography

ECD:

Electrochemical deposition

EFMT:

Electric field-induced mass transfer

FM:

Frequency-modulation

ITRS:

International technology roadmap for semiconductors

KBS:

Knowledge based software

LAO:

Local anodic oxidation

MEMS:

Micro electromechanical system

NFP:

Nanofountain Probes

PCS:

Probe control software

PDMS:

Polydimethylsiloxane

PID:

Proportional-integral-derivative

PMG:

Phenolic molecular glass

RIE:

Reactive ion etch

SAM:

Self-assembled monolayer

SEM:

Scanning electron microscope

SIMS:

Secondary ion mass spectrometry

SNOM:

Scanning near-field optical microscopy

SOI:

Silicon-on-insulator

SPM:

Scanning probe microscopy

SPP:

Surface plasmon polariton

STM:

Scanning tunneling microscopy

TBN:

Tip-based nanofabrication

vdW:

van der Waals

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Acknowledgements

The author would like to acknowledge the support of Pacific Technology, LLC of Phoenix (USA) and the National Science Council (ROC) under Grant No. NSC99-2811-E-007-014 in funding a University Chair professorship at National Tsing Hua University (NTHU) in Hsinchu, Taiwan, where the author spent a semester in preparation of this manuscript in 2010. The author is grateful to Professors Wen-Hwa Chen, Hung Hocheng, and Chien-Chung Fu of NTHU for their hospitality and encouragement during the author’s stay in Hsinchu. Very special thanks are to Professor Jun-ichi Shirakashi of Tokyo University of Agriculture and Technology (Japan), Dr. Andrea Notargiacomo of CNR-IFN (Italy), Dr. Luca Pellegrino of CNR-SPIN (Italy), Professor Thomas W. Kenny of Stanford University (USA), Professor Ari Requicha of the University of Southern California (USA) and Dr. John Dagata of National Institute of Standards and Technology (USA) for their useful information and fruitful discussions.  The author is thankful for the assistance provided by Ms Yu-Shan Huang and Mr. Gwo J. Wu of NTHU in preparing this manuscript.

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  1. School for Engineering of Matter, Transport, and Energy, Arizona State University, Tempe, AZ, 85287-6106, USA

    Ampere A. Tseng

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    Ampere A. Tseng

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Tseng, A.A. (2011). Constraints and Challenges in Tip-Based Nanofabrication. In: Tseng, A. (eds) Tip-Based Nanofabrication. Springer, New York, NY. https://doi.org/10.1007/978-1-4419-9899-6_12

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