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Tip-Based Nanofabrication pp 1–64Cite as

Nanoscale Scratching with Single and Dual Sources Using Atomic Force Microscopes

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Abstract

AFM (atomic force microscope) scratching is a simple yet versatile material removing technique for nanofabrication. It has evolved from a purely mechanical process to one in which the tip can be loaded by additional energy sources, such as thermal, electric, or chemical. In this chapter, scratching techniques using tips with both single and dual sources are reviewed with an emphasis on associated material removing behavior. Recent developments in scratching systems equipped with automated stages or platforms using both single tip and multiple tips are assessed. The characteristics of various approaches for scratching different types of materials, including polymers, metals, and semiconductors, are presented and evaluated. The effects of the major scratching parameters on the final nanostructures are reviewed with the goal of providing quantitative information for guiding the scratching process. Advances in several techniques using dual sources for AFM scratching are then studied with a focus on their versatility and potential for different applications. Finally, following a section on the applications of AFM scratching for fabricating a fairly wide range of nanoscale devices and systems, concluding remarks are presented to recommend subjects for future technological improvement and research emphasis, as well as to provide the author’s perspective on future challenges in the field of AFM scratching.

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Abbreviations

AE:

Acoustic emission

AFM:

Atomic force microscope/microscopy

CNT:

Carbon nanotubes

DA:

Diels–Alder

EBD:

Electron beam induced deposition

ECM:

Electrochemical nanomachining

FET:

Field effect transistor

FWHM:

Full width at half maximum

GO:

Graphene oxide

KOH:

Potassium hydroxide

LAO:

Local anodic oxidation

PC:

Polycarbonate or personal computer

PDMS:

Polydimethylsiloxane

PGMA:

Polyglycidyl-methacrylate

PMMA:

Polymethylmethacrylate

PNBA:

Poly(n-butyl acrylate)

PNIPAM:

Poly(n-isopropylacrylamide)

PS:

Polystyrene

R2 :

Coefficient of determination

SAD:

Self-amplified depolymerization

SAM:

Self-assembled monolayer

SD:

Standard deviation

SEM:

Scanning electron microscope

SIMS:

Secondary ion mass spectrometry

SNOM:

Scanning near-field optical microscopy

SOI:

Silicon on insulator

SPDT:

Single point diamond tools

SPM:

Scanning probe microscopy

SQUID:

Superconducting quantum interference device

SR:

Scratch ratio

STM:

Scanning tunneling microscopy

TCNL:

Thermochemical nanolithography

TEM:

Transmission electron microscopy

TMNL:

Thermomechanical nanolithography

USD:

Unit scratch depth

1DES:

One-dimensional electron system

2DEG:

Two-dimensional electron gas

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Acknowledgements

The author would like to acknowledge the support of Pacific Technology, LLC of Phoenix (USA) and the National Science Council (ROC) under Grant No. NSC99-2811-E-007-014 in funding a University Chair professorship at National Tsing Hua University (NTHU) in Hsinchu, Taiwan, where the author spent a semester in preparation of this manuscript in 2010. The author is grateful to Professors Wen-Hwa Chen, Hung Hocheng, and Chien-Chung Fu of NTHU for their hospitality and encouragement during the author’s stay in Hsinchu. Special thanks are to Professor Jun-ichi Shirakashi of Tokyo University of Agriculture and Technology (Japan), Professor Noritaka Kawasegi of University of Toyama (Japan), Professor Zhuang Li of Chinese Academy of Sciences (China), Professor Patrik Schmuki of University of Erlangen-Nuremberg (Germany), Dr. Eugeniu Balaur of La Trobe University (Australia), Dr. Andrea Notargiacomo of CNR-IFN (Italy), and Dr. Luca Pellegrino of CNR-SPIN (Italy) for their fruitful discussions and useful digital data for illustration and presentation.  The author is thankful for the assistance provided by Maggie S. Tseng and Parag S. Pathak of Arizona State University and by Ms Yichih Liu of NTHU in preparing this manuscript.

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    Ampere A. Tseng

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    Ampere A. Tseng

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Tseng, A.A. (2011). Nanoscale Scratching with Single and Dual Sources Using Atomic Force Microscopes. In: Tseng, A. (eds) Tip-Based Nanofabrication. Springer, New York, NY. https://doi.org/10.1007/978-1-4419-9899-6_1

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