Abstract
Our ability in patterning nanostructures offers a unique path to discovery and innovation in science and technology. When nanostructures are smaller than a fundamental physical length scale, conventional theory may no longer apply and new phenomena emerge. To fully benefit from the discovery and innovation in nanostructures and commercialize them, a low-cost and high-throughput manufacturing of nanostructures is essential. One biggest challenge today is that we still do not have a mature nanostructure manufacturing technology that has the needed low-cost and high-throughput. Nanoimprint lithography is one of the most promising low-cost, high-throughput technologies for manufacturing nanostructures. Significant developments have been made in recent years.
This is a preview of subscription content, log in via an institution.
Buying options
Tax calculation will be finalised at checkout
Purchases are for personal use only
Learn about institutional subscriptionsPreview
Unable to display preview. Download preview PDF.
References
S. Y. Chou, P. R. Krauss, and P. J. RenstromAppl. Phys. Lett. 67, 3114 (1995) and Science (1996), 272, 85.
J. Haisma, M. Verheijen, K.van der Heuvel, and J. van der BergJ. Vac. Sci. Technol. B, (1996), 14, 4124.
P. Rucjjpeft, M. Colburn, B. Choi, Nounu, S. Johnson, C. G. Wilson, et al.J. Vac. Sci. TechnoL, (1999), B 17, 2965.
A. Kumar, G. M. WhitesidesAppl Phys Lett. (1993), 63, 2002.
S. Y. Chou, P. R. Krauss, W. Zhang, L. Guo and L. ZhuangJ. Vac. Sci. TechnoL, (1997), B 15, 2897.
M. Li, L. Chen, W. Zhang, and S. Y. Chou, “3-Dimensional Microfabrication Using Deep Nanoimprint Lithography”, EIPBN, Palm Spring, CA, May 30-June 2, 2000.
X. Sun, L. Zhuang, W. Zhang and S. Y. Chou, J VAC SCI TECHNOL B, (1998), 16, 3922–3925.
W. Zhang and S. Y. Chou, “Multilevel Nanoimprint Lithography With Submicron Alignment on 4” Wafers“, EIPBN, Palm Spring, CA, May 30-June 2, 2000.
F. R.W. Pease, et al., unpublished; and H. I. Smith, unpulished.
H. Tan, A. Gilbertson, S. Y. Chou, J VAC SCI TECHNOL, (1999),B 16, 3926.
M. T. Li, J. Wang, L. Zhuang, and S. Y. ChouAppl Phys Lett (2000), 76, 673.
Z. H. Yu, S. J. Schablitsky, S. Y. ChouAppl. Phys. Lett(1999), 74, 2381.
W. Wu, B. Cui, X. Y. Sun, W. Zhang, L. Zhunag, and S. Y. Chou, J VAC SCI TECHNOL, (1998)B 16, 3825.
J. Wang, S. Schablitsky, Z. Yu, W. Wu, S. Y. ChouJ Vac Sci Tech (1999), B 17, 2957.
Z. H. Yu, P.u Deshpande, W. Wu, J. Wang, and S. Y. ChouAppl Phys Lett. (2000), 77, 927.
J. Wang, X. Y. Sun, L. Chen, S. Y. ChouAppl. Phys. Lett. (1999), 75, 2767–2769.
T. I. Kamins, D. A. A. Ohlberg, R. Stanley Williams, W. Zhang, and S. Y. ChouAppl. Phys. Lett. (1999), 74, 1773.
J. Wang, X. Y. Sun, L. Chen, L. Zhuang, S. Y. Chou “Molecular alignment in submicron patterned polymer matrix using nanoimprint lithography”Appl. Phys. Lett. (1999), 76, 166–168.
Author information
Authors and Affiliations
Editor information
Editors and Affiliations
Rights and permissions
Copyright information
© 2003 Springer Science+Business Media New York
About this chapter
Cite this chapter
Chou, S.Y. (2003). Nanoimprint Lithography. In: Sotomayor Torres, C.M. (eds) Alternative Lithography. Nanostructure Science and Technology. Springer, Boston, MA. https://doi.org/10.1007/978-1-4419-9204-8_2
Download citation
DOI: https://doi.org/10.1007/978-1-4419-9204-8_2
Publisher Name: Springer, Boston, MA
Print ISBN: 978-1-4613-4836-8
Online ISBN: 978-1-4419-9204-8
eBook Packages: Springer Book Archive