Abstract
Microcontact printing (μCP) and Nanoimprint lithography (NIL) have both proven to be high resolution lithography processes suitable for large area parallel lithography.1–7 This property makes them both promising for application in device fabrication, where high throughput is an issue. Especially NIL is used by numerous groups due to its high resolution and potential for applications.8–10
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Schmidt, G., Borzenko, T., Tormen, M., Hock, V., Molenkamp, L.W. (2003). Application of Microcontact Printing and Nanoimprint Lithography. In: Sotomayor Torres, C.M. (eds) Alternative Lithography. Nanostructure Science and Technology. Springer, Boston, MA. https://doi.org/10.1007/978-1-4419-9204-8_14
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DOI: https://doi.org/10.1007/978-1-4419-9204-8_14
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