Abstract
The potential of scanning probe microscopes for the atomic and nanometer scale mod-ification and manipulation of materials was recognized right after the invention of the scanning tunneling microscope STM.1,2 Atomic scale desorption and fragmentation was demonstrated on Si(lll) 7x7 surfaces.3 A paradigmatic example of single atom mod-ification was provided by moving individual atoms of xenon on a nickel surface.4 Since then, a number of methods have been proposed and applied to manipulate mod-ification with atomic and nanometer-scale features.5–9 However, just a few of the mod-ification methods are suitable for the development of a scanning probe-based lithography. Ultra high vacuum requirements, low temperatures or unreliable pattern definition mod-ification considerably the number of methods suitable for lithographic purposes. In this context lithography means a method for large scale patterning of surfaces and device fabrication.
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Garcia, R. (2003). Local Oxidation Nanolithography. In: Sotomayor Torres, C.M. (eds) Alternative Lithography. Nanostructure Science and Technology. Springer, Boston, MA. https://doi.org/10.1007/978-1-4419-9204-8_11
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DOI: https://doi.org/10.1007/978-1-4419-9204-8_11
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