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Low Energy Electron Attachment by Haloalkanes

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Gaseous Dielectrics X

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Abstract

Electron attachment process in three halopropanes, CH3CH2CH2Br, CH3CHBrCH3 and CH3CHBrCF3, have been investigated using an electron swarm and electron capture negation mass spectrometry techniques. All compounds attach electrons in dissociative process, and the main product is bromine ion. The rate constants for thermal electron attachment are equal to 1.1·10−1, 1.4·10−12 and 4.1·10−10 cm3molec.−1 s−1 for CH3CH2CH2Br, CH3CHBrCH3 and CH3CHBrCF3, respectively.

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References

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Author information

Authors and Affiliations

  1. Chemistry Department, University of Podlasie, Siedlce, Poland

    I. Szamrej & M. Foryś

  2. Institute of Physics of Molecules and Crystals, Russian Academy of Science, Ufa, Russia

    N. L. Asfandiarov

Authors
  1. I. Szamrej
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  2. M. Foryś
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  3. N. L. Asfandiarov
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Editor information

Editors and Affiliations

  1. Academy of Athens, Athens, Greece

    Loucas G. Christophorou

  2. National Institute of Standards and Technology, Gaithersburg, Maryland, USA

    James K. Olthoff

  3. National Technical University of Athens, Athens, Greece

    Panayota Vassiliou

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© 2004 Springer Science+Business Media New York

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Szamrej, I., Foryś, M., Asfandiarov, N.L. (2004). Low Energy Electron Attachment by Haloalkanes. In: Christophorou, L.G., Olthoff, J.K., Vassiliou, P. (eds) Gaseous Dielectrics X. Springer, Boston, MA. https://doi.org/10.1007/978-1-4419-8979-6_4

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  • DOI: https://doi.org/10.1007/978-1-4419-8979-6_4

  • Publisher Name: Springer, Boston, MA

  • Print ISBN: 978-1-4613-4745-3

  • Online ISBN: 978-1-4419-8979-6

  • eBook Packages: Springer Book Archive

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