Abstract
The collision of electrons with molecules is one of the most fundamental of physical processes. Many mechanisms can take place, including inelastic and elastic scattering, ionization, and capture. These mechanisms are being used in a wide and expanding variety of industrial applications. A thorough understanding of each of these processes provides information which could, for example, be used to optimize electron and ion densities in plasmas to enhance critical reactions involved in many technologies and which will be essential to the development of the next generation of plasma processing plants. Such information is considered to be a priority in a report from a panel on “Database Needs for Modeling and Simulation of Plasma Processing”, for the Board of Physics and Astronomy, National Research Council, U.SA.1 Our ability to control electron interactions therefore provides exciting new opportunities that can be exploited by both the research and technological communities.
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Mayhew, C.A. (2004). Electron Attachment to Sulphur Hexafluoride and other Fluorine Containing Molecules Investigated using Electron Swarm Techniques. In: Christophorou, L.G., Olthoff, J.K., Vassiliou, P. (eds) Gaseous Dielectrics X. Springer, Boston, MA. https://doi.org/10.1007/978-1-4419-8979-6_3
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DOI: https://doi.org/10.1007/978-1-4419-8979-6_3
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