Transport Coefficients for Electrons in CF4 in E(t)×B(t) Fields
Low pressure discharges sustained by radio-frequency (rf) electric fields, are widely used in microelectronic fabrication and manufacture of new materials1. In these applications it is desirable to generate high density, large volume nonequilibrium plasma in collision dominated regime. Most plasmas are driven by sources with frequencies ranging from several tens to several hundreds of MHz. In case of Inductively Coupled Plasmas (ICP) and magnetically enhanced plasmas, the magnetic field is present leading to spatial trapping of electrons. Investigation of electron transport and of the kinetic phenomena that may occur2, in crossed dc and rf fields is highly desirable as the basis for plasma models under circumstances that are typical for plasma processing. On the other hand, modeling of gaseous dielectrics may benefit greatly from the studies of gases for plasma etching as often the same gases are used in both applications.
KeywordsAnisotropy Fluoride Tetrafluoromethane
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