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Silicon Nitride Ceramics

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Atomic Scale Characterization and First-Principles Studies of Si₃N₄ Interfaces

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Abstract

The widespread interest in silicon nitride ceramics stems from their desirable physical and mechanical properties in many high temperature and pressure applications [1–5]. Good resistance to oxidation and corrosive environments, low coefficient of friction and thermal expansion, negligible creep, and high decomposition temperature are some of these important properties. Because of these, silicon nitride (especially its polymorph) is widely used in gas turbines, engine parts, bearings, dental drills and gauges, and cutting tools. In addition, thin films and coatings have been studied in relation to high-speed memory devices [6–10] and optical waveguide applications [11].

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  1. Argonne National Laboratory, Argonne, IL, USA

    Weronika Walkosz

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Walkosz, W. (2011). Silicon Nitride Ceramics. In: Atomic Scale Characterization and First-Principles Studies of Si₃N₄ Interfaces. Springer Theses. Springer, New York, NY. https://doi.org/10.1007/978-1-4419-7817-2_1

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