Abstract
Laser-produced plasmas can be used as extreme ultraviolet (EUV) sources for lithography, operating in the 13.5 nm range. Soft X-rays emitted from laser-produced tin plasma were simulated using the EHYBRID code. Required atomic data for tin ions were calculated using the Cowan code. In the EHYBRID simulations tin slab target is assumed to be irradiated by 1064 nm wavelength Nd:YAG laser. Simulations were performed for different driving laser parameters.
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Demir, P., Demir, P., Kacar, E., Bilikmen, S.K., Demir, A. (2009). Conversion Efficiency Calculations for Soft X-Rays Emitted from Tin Plasma for Lithography Applications. In: Lewis, C.L.S., Riley, D. (eds) X-Ray Lasers 2008. Springer Proceedings in Physics, vol 130. Springer, Dordrecht. https://doi.org/10.1007/978-1-4020-9924-3_32
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DOI: https://doi.org/10.1007/978-1-4020-9924-3_32
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