Summary
Fully epitaxial germanium-on-insulator structures have been grown for the first time on (001) Si substrates by using a perovskite oxide template. Detailed transmission electron microscopy analysis revealed that a two-temperature growth procedure is required in order to avoid three-dimensional island growth and to obtain continuous and flat Ge films. The interface between the oxide and Ge is fully crystalline and atomically sharp. A high density of stacking faults and twin structures has been found preferentially originating from the surface roughness of the oxide.
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Dieker, C. et al. (2008). Epitaxial (001) Ge on Crystalline Oxide Grown on (001) Si. In: Cullis, A.G., Midgley, P.A. (eds) Microscopy of Semiconducting Materials 2007. Springer Proceedings in Physics, vol 120. Springer, Dordrecht. https://doi.org/10.1007/978-1-4020-8615-1_27
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DOI: https://doi.org/10.1007/978-1-4020-8615-1_27
Publisher Name: Springer, Dordrecht
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Online ISBN: 978-1-4020-8615-1
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