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Abstract

In 1950 Shockley succeeded in overcoming the earlier difficulties caused by the influence of surface states which had until then prevented a practical field-effect transistor. He used a pn junction gate to eliminate the effect of the surface states. The main advantage of such transistors compared to MOS transistors is their low 1 /f noise. The reason for this is that in an MOS transistor the current flows in a very thin surface layer and is therefore very sensitive to temporary surface charges. In a JFET the current flows in a channel which may be so far away from the surface that its effect is negligible. Such transistors are therefore used primarily in low noise applications.

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Further reading

  1. S. M. Sze, Physics of Semiconductor Devices, Wiley-Interscience, New York (1969)

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  2. L. S. Sevin, Field-Effect Transistors (pnjunction gate) McGraw-Hill, New York (1965)

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  3. C. D. Todd Junction Field-Effect Transistors, Wiley, New York (1968)

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  4. Microwave field-effect transistors. Special issue, IBM Journal of Research and Development, 14 (March 1970)

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  5. J. T. Wallmark and J. H. Scott. Switching and storage characteristics of MIS memory transistors. RCA Rev., 30 (1969) 335

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  6. D. Frohman-Bentchkowski and M. Lenzlinger. Charge transport and storage in metal nitride oxide silicon (MNOS) structures.J. appl. Phys., 40 (1969) 3307

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  7. L. G. Carlstedt and C. M. Svensson. MNOS memory transistors in simple memory arrays. IEEE J. Solid State Circuits, SC-7 (1972) 382

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© 1974 J. T. Wallmark and L. G. Carlstedt

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Wallmark, J.T., Carlstedt, L.G. (1974). Special Types of Field-Effect Transistors. In: Field-Effect Transistors in Integrated Circuits. Palgrave, London. https://doi.org/10.1007/978-1-349-02053-9_4

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  • DOI: https://doi.org/10.1007/978-1-349-02053-9_4

  • Publisher Name: Palgrave, London

  • Print ISBN: 978-1-349-02055-3

  • Online ISBN: 978-1-349-02053-9

  • eBook Packages: EngineeringEngineering (R0)

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