Abstract
In 1950 Shockley succeeded in overcoming the earlier difficulties caused by the influence of surface states which had until then prevented a practical field-effect transistor. He used a pn junction gate to eliminate the effect of the surface states. The main advantage of such transistors compared to MOS transistors is their low 1 /f noise. The reason for this is that in an MOS transistor the current flows in a very thin surface layer and is therefore very sensitive to temporary surface charges. In a JFET the current flows in a channel which may be so far away from the surface that its effect is negligible. Such transistors are therefore used primarily in low noise applications.
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Further reading
S. M. Sze, Physics of Semiconductor Devices, Wiley-Interscience, New York (1969)
L. S. Sevin, Field-Effect Transistors (pnjunction gate) McGraw-Hill, New York (1965)
C. D. Todd Junction Field-Effect Transistors, Wiley, New York (1968)
Microwave field-effect transistors. Special issue, IBM Journal of Research and Development, 14 (March 1970)
J. T. Wallmark and J. H. Scott. Switching and storage characteristics of MIS memory transistors. RCA Rev., 30 (1969) 335
D. Frohman-Bentchkowski and M. Lenzlinger. Charge transport and storage in metal nitride oxide silicon (MNOS) structures.J. appl. Phys., 40 (1969) 3307
L. G. Carlstedt and C. M. Svensson. MNOS memory transistors in simple memory arrays. IEEE J. Solid State Circuits, SC-7 (1972) 382
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© 1974 J. T. Wallmark and L. G. Carlstedt
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Wallmark, J.T., Carlstedt, L.G. (1974). Special Types of Field-Effect Transistors. In: Field-Effect Transistors in Integrated Circuits. Palgrave, London. https://doi.org/10.1007/978-1-349-02053-9_4
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DOI: https://doi.org/10.1007/978-1-349-02053-9_4
Publisher Name: Palgrave, London
Print ISBN: 978-1-349-02055-3
Online ISBN: 978-1-349-02053-9
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