Advertisement

The Deposition of Thin Films in a Vacuum

  • F. Cappendijk
Chapter

Abstract

The coating of surfaces by vacuum deposition is an art already having a wide range of uses. Evaporation takes place in a vacuum. An explanation of the vacuum technology involved and of the art of applying thin films is given in 2.2 and 2.3. An explanation of sputtering is given in 2.3.2. Optical and electrical applications will be discussed in 2.4. Lastly, Section 2.5 deals with the measurement of film thicknesses. Although some aspects have had to be discussed rather briefly, references to the literature are included wherever possible. Where practical considerations demand this, we have departed from the so-called rational system of units (ISO).

Preview

Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.

References

  1. [1]
    S. Tolansky, Multiple Beam Interferometrie of Surfaces and Films, Oxford, 1948.Google Scholar
  2. [2]
    H. Mayer, Physik dünner Schichten, Vol. 1.Google Scholar
  3. [3]
    W. Steckelmacher et al. Vacuum, 9 (1959), 171.CrossRefGoogle Scholar
  4. [3b]
    K. Wohak and A. J. Schmidt, Zeitschrift für angewandte Physik, 17 (1965), 144.Google Scholar
  5. [4]
    P. Giacomo and P. Jacquinot, Phys. Rad, 13 (1952), Feb. supplement.Google Scholar
  6. [6]
    P. D. Foche, Josa, 40 (1950), 623.CrossRefGoogle Scholar
  7. [6b]
    G. C. Mönch, Optik, 8 (1951), 550.Google Scholar
  8. [7]
    G. C. Mönch, Optik, 9 (1952), 75.Google Scholar
  9. [8a]
    G. D. Scott et al., J. Appl. Phys., 21 (1950), 843.CrossRefGoogle Scholar
  10. [8b]
    G. Koppelman et al., Optik, 18 (1961), 349.Google Scholar
  11. [8c]
    O. S. Heavens, Proc. Phys. Soc., 64 (1951), 419.CrossRefGoogle Scholar
  12. [9]
    F. A. Lucy, J. Chem. Phys. 16 (1948), 167.CrossRefGoogle Scholar
  13. [9a]
    A. Vasicek, Josa, 37 (1947) 145.CrossRefMathSciNetGoogle Scholar
  14. [9b]
    F. J. McChrachin et al. Journal Res N.B.S. 67 (1963) 363.CrossRefGoogle Scholar
  15. [9c]
    F. Abeles et al., Acad. Sci, Paris, 228 (1949), 553.Google Scholar
  16. [9d]
    A. Vasicek, Josa, 37 (1947), 979.CrossRefMathSciNetGoogle Scholar
  17. [10]
    A. B. Winterbotten, Josa, 38 (1948), 1074.CrossRefGoogle Scholar
  18. [10a]
    A. Rothem, Rev. Sci. Instrum., 16 (1945), 26.CrossRefGoogle Scholar
  19. [10b]
    A. Rothem et al., Rev. Sci. Instrum., 20 (1949), 66.CrossRefGoogle Scholar
  20. [11]
    J. P. Archard et al., Proc. Phys. Soc., 65 (1952), 758.CrossRefGoogle Scholar
  21. [11a]
    P. L. Glegg, Proc. Phys. Soc. 65 (1952), 774.CrossRefGoogle Scholar
  22. [11b]
    A. Hermansen, Nature 167 (1951), 104.CrossRefGoogle Scholar
  23. [12]
    Lostls, Revue d’optique, 38 (1951), no. 1.Google Scholar
  24. [12a]
    S. J. Lins et al. Trans. 7th Vac. Symp., 1960. Pergamon Press, Oxford, p. 333–338.Google Scholar
  25. [12b]
    A. Duthie et al., Electronic Engineering, 35 (1961), p. 430.Google Scholar
  26. [12c]
    V. D. Rijsanek, Applied optics, 4 (1965), 993.CrossRefGoogle Scholar
  27. [12d]
    G. Sauerbrey, Z. Physik, 155 (1959), 206.CrossRefGoogle Scholar
  28. [12e]
    Revue de la Société royale Belge des Ingenieurs et des Industriels (1965), p. 225–228.Google Scholar
  29. [13]
    J. P. Thomasand B. Saudreau, L’onde Electrique, 44 (1964), 1308.Google Scholar
  30. [14]
    G. R. Giedd and M. H. Perkins, Rev. Sci. Instrum., 31 (1960), 733.CrossRefGoogle Scholar
  31. [14b]
    M. H. Perkins, 8th Trans. Vac. Symp., Washington D.C. (1961), p. 1025, Pergamon, N.Y. 1962.Google Scholar
  32. [15]
    J. B. Valdes, Proc. IRE, 42 (1954), 420.CrossRefGoogle Scholar

Copyright information

© N.V. Philips’ Gloeilampenfabrieken, Eindhoven 1971

Authors and Affiliations

  • F. Cappendijk

There are no affiliations available

Personalised recommendations