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Optimization models for semiconductor dopant profiling

  • Martin Burger
  • Michael Hinze
  • Rene Pinnau
Part of the Modeling and Simulation in Science, Engineering and Technology book series (MSSET)

Abstract

The design of semiconductor devices is an important and challenging task in modern microelectronics, which is increasingly being carried out via mathematical optimization with models for the device behavior. The design variable (and correspondingly the unknown in the associated optimization problems) is the device doping profile, which describes the (charge) density of ion impurities in the device and is therefore modeled as a spatially inhomogeneous function. The optimization goals are usually related to the device characteristics, in particular to outflow currents on some contacts. This is also the typical setup we shall confine ourselves to in this chapter, namely to (approximately) achieve a certain goal related to the outflow current on a contact (e.g., a maximization or just an increase of the current), ideally with minimal change of the doping profile to some given reference state.

Keywords

Design Variable Lagrange Multiplier Optimization Model Limit Problem Semiconductor Dopant 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Birkhäuser Boston 2007

Authors and Affiliations

  • Martin Burger
    • 1
  • Michael Hinze
    • 2
  • Rene Pinnau
    • 3
  1. 1.Institut für IndustriemathematikJohannes Kepler UniversitätLinzAustria
  2. 2.Institut für Numerische MathematikTechnische Universität DresdenDresdenGermany
  3. 3.Fachbereich MathematikTechnische Universität KaiserslauternKaiserslauternGermany

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