Abstract
This chapter provides a review of the most important modeling issues for the simulation of the phase change memory (PCM) operation and reliability. After a short description of the PCM operation principle, the chapter will focus on electrical conduction characteristics for the amorphous and the crystalline phase of the chalcogenide material. The modeling of the programming operation and the methodology for calculating the programming current for phase transition will be described. Modeling-based methods for optimizing and scaling down the reset current will also be discussed. Cell reliability will finally be addressed, showing physics-based modeling approaches for crystallization and structural relaxation processes, which affect the stability of the amorphous phase and PCM data retention.
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Pellizzer, F., Benvenuti, A., Gleixner, B., Kim, Y., Johnson, B., Magistretti, M., Marangon, T., Pirovano, A., Bez, R., Atwood, G.: A 90 nm phase change memory technology for stand-alone non-volatile memory applications. In: Symp. on VLSI Tech. Dig., pp. 122–123. (2006)
Ahn, S. J., Song, Y. J., Jeong, C. W., Shin, J. M., Fai, Y., Hwang, Y. N., Lee, S. H., Ryoo, K. C., Lee, S. Y., Park, J. H., Horii, H., Ha, Y. H., Yi, J. H., Kuh, B. J., Koh, G. H., Jeong, G. T., Jeong, H. S., Kim, K., Ryu, B. Y.: Highly manufacturable high density phase change memory of 64 Mb and beyond. In: IEDM Tech. Dig., pp. 907–910. (2004)
Pirovano, A., Lacaita, A. L., Benvenuti, A., Pellizzer, F., Bez, R.: Electronic switching in phase-change memories. IEEE Trans. Electron Devices 51, 452–459 (2004)
Ielmini, D., Lacaita, A. L., Pirovano, A., Pellizzer, F., Bez, R.: Analysis of phase distribution in phase-change nonvolatile memories. IEEE Electron Device Lett. 25, 507–509 (2004)
Pellizzer, F., Pirovano, A., Ottogalli, F., Magistretti, M., Scaravaggi, M., Zuliani, P., Tosi, M., Benvenuti, A., Besana, P., Cadeo, S., Marangon, T., Moranti, R., Piva, R., Spandre, A., Zonca, R., Modelli, A., Varesi, E., Lowrey, T., Lacaita, A., Casagrande G., Bez, R.:Novel μtrench phase change memory cell for embedded and stand alone non volatile memory applications. In: Symp. VLSI Tech. Dig., pp. 18-19. (2004)
Hindley, N. K.: Random phase model of amorphous semiconductors I. Transport and optical properties. J. Non-Crystalline Solids 5, 17–30 (1970)
Ielmini D., Zhang, Y.: Evidence for trap-limited transport in the sub-threshold conduction regime of chalcogenide glasses. Appl. Phys. Lett. 90, 192102 (2007)
Thomas, C. B.: The temperature dependence of the non-ohmic current and switching characteristics of a chalcogenide glass. J. Phys. D 9, 2587–2596 (1976)
Ielmini, D., Zhang, Y.: Analytical model for subthreshold conduction and threshold switching in chalcogenide-based memory devices. J. Appl. Phys. 102, 054517 (2007)
Jonscher, A. K., Hill, R. M.: Electrical conduction in disordered nonmetallic films. In Hass, G., Francombe, M. H., Hoffman, R. W. (eds.) Physics of thin films, Vol. 8. Academic Press, (1975)
Redaelli, A., Pirovano, A., Pellizzer, F., Lacaita, A. L., Ielmini, D., Bez, R.: Electronic switching effect and phase-change transition in chalcogenide materials. IEEE Electron Device Lett. 25, 684–686 (2004)
Ielmini, D., Mantegazza, D., Lacaita, A. L., Pirovano, A., Pellizzer, F.: Parasitic reset in the programming transient of phase change memories. IEEE Electron Device Lett. 26, 799–801 (2005)
Adler, D., Shur, M. S., Silver M., Ovshinsky, S. R.: Threshold switching in chalcogenide-glass thin films. J. Appl. Phys. 51, 3289–3309 (1980)
Prakash, S., Asokan, S., Ghare, D. B.: A guideline for designing chalcogenide-based glasses for threshold switching characteristics. IEEE Electron Device Lett. 18, 45–47 (1997)
Ovshinsky, S. R.: Localized states in the gap of amorphous semiconductors. Phys. Rev. Lett. 36, 1469–1472 (1976)
Adler, D., Henisch, H. K., Mott, N.: The mechanism of threshold switching in amorphous alloys. Rev. Mod. Phys. 50, 209–220 (1978)
Mott, N. F.: Electrons in Glass. In: Lundqvist, S. (ed.) Nobel Lectures, Physics 1971-1980. World Scientific Publishing Co., Singapore (1992)
Emin, D.: Current-driven threshold switching of a small polaron semiconductor to a metastable conductor. Phys. Rev. B 74, 035206 (2006)
Jonscher, A. K.: Energy losses in hopping conduction at high electric fields. J. Phys. C 4, 1331–1340 (1971)
Jonscher, A. K., Loh, C. K.: Poole-Frenkel conduction in high alternating electric fields. J. Phys. C 4, 1341–1347 (1971)
Lacaita, A. L., Redaelli, A., Ielmini, D., Pellizzer, F., Pirovano, A., Benvenuti, A., Bez, R.: Electrothermal and phase-change dynamics in chalcogenide-based memories. In: IEDM Tech. Dig., pp. 911-914. (2004)
Russo, U., Ielmini, D., Redaelli, A., Lacaita, A. L.: Modeling of programming and read performance in phase-change memories – Part I: cell optimization and scaling. IEEE Trans. Electron Devices 55, 506-514, (2008)
Hwang, Y. N., Lee, S. H., Ahn, S. J., Lee, S. Y., Ryoo, K. C., Hong, H. S., Koo, H. C., Yeung, F., Oh, J. H., Kim, H. J., Jeong, W. C., Park, J. H., Horii, H., Ha, Y. H., Yi, J. H., Koh, G. H., Jeong, G. T., Jeong, H. S., Kim, K.: Writing current reduction for high-density phase-change RAM. In: IEDM Tech. Dig., pp. 893-896. (2003)
International Roadmap for Semiconductors—Process Integration, Devices, and Structures. 2007 Release. http://www.itrs.net/(2007). Accessed 17 April 2008.
Pirovano, A., Lacaita, A. L., Benvenuti, A., Pellizzer, F., Hudgens, S., Bez, R.: Scaling analysis of phase change memory technology. In: IEDM Tech. Dig., pp. 699-702. (2003)
Pirovano, A., Redaelli, A., Pellizzer, F., Ottogalli, F., Tosi, M., Ielmini, D., Lacaita, A. L., Bez, R.: Reliability study of phase-change non volatile memories. IEEE Trans. Device Mater. Rel. 4, 422–427 (2004)
Redaelli, A., Ielmini, D., Russo, U., Lacaita, A. L.: Intrinsic data retention in nanoscaled phase-change memories – Part II: Statistical analysis and prediction of failure time. IEEE Trans. Electron Devices 53, 3040–3046 (2006)
Russo, U., Ielmini, D., Lacaita, A. L.: Analytical modeling of chalcogenide crystallization for PCM data-retention extrapolations. IEEE Trans. Electron Devices 54, 2769 – 2777 (2007)
Russo, U., Ielmini, D., Redaelli, A., Lacaita, A. L.: Intrinsic data retention in nanoscaled PCMs—Part I: Monte Carlo model for crystallization and percolation. IEEE Trans. Electron Devices 53, 3032–3039 (2006)
Stathis, J. H.: Percolation models for gate oxide breakdown. J. Appl. Phys. 86, 5757–5766 (1999)
Ielmini, D., Spinelli, A. S., Lacaita, A. L., van Duuren, M. J.: Impact of correlated generation of oxide defects on SILC and breakdown distributions. IEEE Trans. Electron Devices 51, 1281–1287 (2004)
Christian, J. W.: The Theory of Transformations in Metals and Alloys. Oxford, U.K. (1975)
Senkader, S., Wright, C. D.: Models for phase-change of Ge2Sb2Te5 in optical and electrical memory devices. J. Appl. Phys. 95, 504–511 (2004)
Peng, C., Cheng, L., Mansuripur, M.: Experimental and theoretical investigations of laser-induced crystallization and amorphization in phase change optical recording media. J. Appl. Phys. 82, 4183–4191 (1997)
Ruitenberg, G., Petford-Long, A. K., Doole, R. C.: Determination of the isothermal nucleation and growth parameters for the crystallization of thin Ge2Sb2Te5 films. J. Appl. Phys. 92, 3116–3123 (2002)
Kalb, J., Spaepen, F., Wuttig, M.: Atomic force microscopy measurements of crystal nucleation and growth rates in thin films of amorphous Te alloys. Appl. Phys. Lett. 84, 5240–5242 (2004)
Singh, H. B., Holz, A.: Stability limit of supercooled liquids. Solid State Commun. 4, 985–987 (1983)
Kalb, J. A., Spaepen, F., Wutting, M.: Kinetics of crystal nucleation in undercooled droplets of Sb- and Te-based alloys used for phase change recording. J. Appl. Phys. 98, 54910 (2005)
Mantegazza, D., Ielmini, D., Pirovano, A., Varesi, E., Lacaita, A. L.: Statistical analysis and modeling of programming and retention in PCM arrays. In: IEDM Tech. Dig. 311–314. (2007)
Roorda, S., Sinke, W. C., Poate, J. M., Jacobson, D. C., Dierker, S., Dennis, B. S., Eaglesham, D. J., Spaepen, F., Fuoss, P.: Structural relaxation and defect annihilation in pure amorphous silicon. Phys. Rev. B 44, 3702–3725 (1991)
Khonik, V. A., Kitagawa, K., Morii, H.: On the determination of the crystallization activation energy of metallic glasses. J. Appl. Phys. 87 8440–8443 (2000)
Koughia, K., Shakoor, Z., Kasap, S. O., Marshall, J. M.: Density of localized electronic states in a-Se from electron time-of-flight photocurrent measurements. J. Appl. Phys. 97, 3706–3716 (2005)
Kasap, S. O., Yannacopoulus, S.: Kinetics of structural relaxations in the glassy semiconductor a-Se. J. Mater. Res. 4, 893–905 (1989)
Pirovano, A., Lacaita, A. L., Pellizzer, F., Kostylev, S. A., Benvenuti, A., Bez, R.: Low-field amorphous state resistance and threshold voltage drift in chalcogenide materials. IEEE Trans. Electron Devices 51, 714–719 (2004)
Ielmini, D., Lacaita, A. L., Mantegazza, D.: Recovery and drift dynamics of resistance and threshold voltages in phase-change memories. IEEE Trans. Electron Devices 54, 308–315 (2007)
Roorda, S., Doorn, S., Sinke, W. C., Scholte, P. M. L. O., van Loenen, E.: Calorimetric evidence for structural relaxation in amorphous silicon. Phys. Rev. Lett. 62, 1880–1883 (1989)
Kalb, J. A., Wuttig, M., Spaepen, F.: Calorimetric measurements of structural relaxation and glass transition temperatures in sputtered films of amorphous Te alloys used for phase change recording. J. Mater. Res. 22, 748–754 (2007)
Kasap, S. O., Polischuk, B., Aiyah, V., Yannacopoulos, S.: Drift mobility relaxation in a-Se. J. Appl. Phys. 67, 1918–1922 (1990)
Ielmini, D., Lavizzari, S., Sharma D., Lacaita, A. L.: Physical interpretation, modeling and impact on phase change memory (PCM) reliability of resistance drift due to chalcogenide structural relaxation. In: IEDM Tech. Dig., pp. 939–942. (2007)
Russo, U., Ielmini, D., Redaelli, A., Lacaita, A. L.: Modeling of programming and read performance in phase-change memories . Part II: Program disturb and mixed scaling approach. IEEE Trans. Electron Devices 55, 515-522 (2008)
Hirasawa, M., Orii, T., Seto, T.: Size-dependent crystallization of Si nanoparticles. Appl. Phys. Lett 88, 093119 (2006)
Raoux, S., Rettner, C. T., Jordan-Sweet, J. L., Deline, V. R., Philipp, J. B., Lung, H.-L., Scaling properties of phase change nanostructures and thin films. In: European Symposium on Phase Change and Ovonic Science. (2006)
Qiao, B., Feng, J., Lai, Y., Cai, Y., Lin, Y., Tang, T., Cai B., Chen, B.: Si–Sb–Te films for phase-change random access memory. Semiconductor Science and Technology 21, 1073-1076 (2006)
Morikawa, T., Kurotsuchi, K., Kinoshita, M., Matsuzaki, N., Matsui, Y., Fujisaki, Y., Hanzawa, S., Kotabe, A., Terao, M., Moriya, H., Iwasaki, T., Matsuoka, M., Nitta, F., Moniwa, M., Koga, T., Takaura, N.: Doped In-Ge-Te phase change memory featuring stable operation and good data retention. In: IEDM Tech. Dig., pp. 307–310. (2007)
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Ielmini, D. (2009). Phase Change Memory Device Modeling. In: Raoux, S., Wuttig, M. (eds) Phase Change Materials. Springer, Boston, MA. https://doi.org/10.1007/978-0-387-84874-7_14
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DOI: https://doi.org/10.1007/978-0-387-84874-7_14
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