Ultrasonic Emission from Nanocrystalline Porous Silicon

  • Hiroyuki Shinoda*
  • Nobuyoshi Koshida
Part of the Nanostructure Science and Technology book series (NST)


A simple layer structure composed of a metal thin film and a porous silicon layer on a silicon substrate generates intense and wide-band airborne ultrasounds. The large-bandwidth and the fidelity of the sound reproduction are leveraged in applications varying from sound-based measurement to a scientific study of animal ecology. This chapter describes the basic principle of the ultrasound generation. The macroscopic properties of the low thermal conductivity and the small heat capacity of nanocrystalline porous silicon thermally induce ultrasonic emission. The state-of-the-art of the achievable sound pressure and sound signal properties is introduced, with the technological and scientific applications of the devices.


Porous Silicon Radiation Pressure Acoustic Pressure Thin Metal Film Porous Silicon Layer 
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Copyright information

© Springer Science+Business Media, LLC 2009

Authors and Affiliations

  • Hiroyuki Shinoda*
    • 1
  • Nobuyoshi Koshida
    • 1
  1. 1.University of TokyoJapan

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