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Density Functional Theory of High-k Dielectric Gate Stacks

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Nanoelectronics and Photonics

Part of the book series: Nanostructure Science and Technology ((NST))

Abstract

Density functional theory has proved to be a useful tool in device engineering, particularly at nanoscale and when novel materials are involved. In this chapter we briefly introduce the theoretical background necessary for understanding the modern theory of solid state and review recent theoretical results in the area of advanced gate stack materials engineering.

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Acknowledgments

I wish to thank many colleagues for insightful discussions we have had over the years and my graduate students at the University of Texas, Onise Sharia, Xuhui Luo and Jaekwang Lee, for their hard work and help with the manuscript. This work in part is supported by the National Science Foundation under grants DMR-0548182 and DMR-0606464 and by the Office of Naval Research under grant N000 14-06-1-0362.

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Authors and Affiliations

  1. Department of Physics, The University of Texas at Austin, Austin, TX 78712, USA

    Alexander A. Demkov

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  1. Alexander A. Demkov
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Editors and Affiliations

  1. Nano and Giga Solutions, Gilbert, AZ, USA

    Anatoli Korkin

  2. Initiative National de la Recherche Scientifique, Énergie, Matériaux et Télécommunications, UniversitÉdu QuÉbec, QuÉbec, QC, Canada

    Federico Rosei

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Demkov, A.A. (2008). Density Functional Theory of High-k Dielectric Gate Stacks. In: Korkin, A., Rosei, F. (eds) Nanoelectronics and Photonics. Nanostructure Science and Technology. Springer, New York, NY. https://doi.org/10.1007/978-0-387-76499-3_7

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