Integrate Circuit Fabrication Technology Optical Lithography Dimensional Scale Nanofabrication Technique 


  1. 1.
    Harvard’s George Whitesides on Nanotechnology: “A Word, Not a Field”. Science Watch, 2002 (July/August). 13(4).Google Scholar
  2. 2.
    US National Nanotechnology Initiative (NNI). [cited; Available from:
  3. 3.
    International Technology Roadmap for Semiconductors (ITRS). [cited; Available from:
  4. 4.
    Mack, C., Predicting the Future in the Past. Semiconductor International, 2007 (September).Google Scholar
  5. 5.
    TSMC Reports Foundry's First 32-Nanometer Technology with Functional SRAM. Semicopnductor International, 2007(December).Google Scholar
  6. 6.
    Chou, S.Y., P.R. Krauss, and P.J. Renstrom, Imprint of sub-25 nm vias and trenches in polymers. Appl. Phys. Lett., 1995. 67(21): p. 3114.CrossRefGoogle Scholar
  7. 7.
    Xia, Y. and G.M. Whitesides, Soft lithography. Angew. Chem. Int. Ed., 1998. 37: pp. 550–575.CrossRefGoogle Scholar
  8. 8.
    Bjorkholm, J.E., EUV lithography—the successor to optical lithography ? Intel Technol. J. 1998. Q3’98: p. 1.Google Scholar
  9. 9.
    Colburn, M., et al., Step and flash imprint lithography: A new approach to high-resolution patterning. Proc. SPIE 1999. 3676: p. 379.CrossRefGoogle Scholar
  10. 10.
    Tseng, A.A., A. Notargiacomo, and T.P. Chen, Nanofabrication by scanning probe microscope lithography: A review. J. Vac. Sci. Technol., 2005. B23(3): p. 877.Google Scholar
  11. 11.
    Zhirnov, V.V. and D.J.C. Herr, New frontiers: Self-assembly and nanoelectronics. IEEE Comput., 2001. 34(1): pp. 34–43.CrossRefGoogle Scholar
  12. 12.
    Cui, Z., Micro-Nanofabrication Technologies and Applications. 2006, Springer.Google Scholar

Copyright information

© Springer Science+Business Media, LLC 2008

Authors and Affiliations

  1. 1.Rutherford Appleton LaboratoryDidcotUK

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