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Insulated-Gate Field-Effect Transistor

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Silicon Devices and Process Integration

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A field-effect transistor consists of four terminals: gate, source, drain and body or substrate (Fig. 5.1). The field created by a voltage applied to a gate modulates the resistance of region under the gate between source and drain. The modulated region of the transistor body is referred to as the channel. There are three types of field-effect transistors shown in Fig. 5.1, of which the MOSFET is one. In a MOSFET, the gate consists of an MOS structure that slightly overlaps two junctions located on either side of the gate. The source and drain are of opposite polarity to the body. This type of transistor is also known as an insulated field-effect transistor, IGFET, because the gate is separated from the body by an insulator. In a junction field-effect transistor or JFET, one or two pn junctions act as the gate that modulates the width of a conductive path between the source and drain. The source and drain are of the same polarity type as the body. A metal-semiconductor field-effect transistor, or MESFET, operates similarly to a JFET, except that the gate consists of a Schottky-barrier diode formed between a metal in contact with the semiconductor

This chapter focuses on the MOSFET which is by far the most common. The discussion of a JFET follows in the next chapter

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(2009). Insulated-Gate Field-Effect Transistor. In: Silicon Devices and Process Integration. Springer, Boston, MA. https://doi.org/10.1007/978-0-387-69010-0_5

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