5. Conclusion
In summary, we have realized a series of experiments with a compact 46.9 nm wavelength laser that produces intense pulses of nanosecond duration to study the ablation behavior of metals, common polymers, and Sc/Si multilayers. The key ablation process in polymers is likely to be a radiolysis of the polymer chains by EUV photons, resulting in the formation of numerous small molecular fragments that are subsequently removed from the surface of the samples. The EUV ablation rates for different polymers were found to be almost material independent, ∼ 50 – 400 nm/pulse. In each material EUV irradiation was observed to leave smooth craters with well defined edges and without signs of thermal damage. No threshold behavior was detected in the EUV ablation of the polymers in the range of fluences used in the experiment. In contrast to polymers the irradiation damage in metals and in Sc/Si multilayers is thermal in nature. A damage threshold of 0.08 J/cm2 was measured in the multilayer mirror coatings deposited on Si or borosilicate glass substrates, compared with a measured value of 0.7 J/cm2 for bare Si substrates. These results are relevant to the use of these mirrors with newly developed high-power EUV laser sources and provide a benchmark for their further improvement. In combination, the experiments demonstrate that compact extreme ultraviolet lasers are new tools available for surface modification studies and patterning.
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References
Anderson, A. T., Tobin, M. T., and Peterson, P. F., 1994, X-ray response of National-Ignition-Facility first surface materials, Fusion Technol. 26: 804–808.
Balandin, A., Khitun, A., Liu, J. L., Wang, K. L., Borca-Tasciuc, T., and Chen, G., 1999, Optimization of the thermoelectric properties of low-dimensional structures via phonon engineering, Proc. International Conference on Thermoelectrics, IEEE, Piscataway, pp. 189–192.
Bauerle, D., 1996, Laser Processing and Chemistry, 2nd ed., Springer, Berlin.
Beetz, T., and Jacobsen, C., 2003, Soft X-ray radiation-damage studies in PMMA using a cryo-STXM, J. Synchrotron Radiat. 10: 280–283.
Benware, B. R., Macchietto, C. D., Moreno, C. H., and Rocca, J. J., 1998, Demonstration of a high average power tabletop soft X-ray laser, Phys. Rev. Lett. 81: 5804–5807.
Benware, B. R., Ozols, A., Rocca, J. J., Artioukov, I. A., Kondratenko, V. V., and Vinogradov, A. V., 1999, Focusing of a tabletop soft-x-ray laser beam and laser ablation, Opt. Lett. 24: 1714–1716.
Capeluto, M. G., Vaschenko, G., Grisham, M, Marconi, M. C, Ludueña, S., Pietrasanta, L., Lu, Y., Parkinson, B., Menoni, C. S., and Rocca, J. J., 2005, Nanopatterning with interferometric lithography using a compact λ = 46.9 nm laser, IEEE Trans. Nanotechnol., in press.
Chen, G., and Neagu, M., 1997, Thermal conductivity and heat transfer in superlattices, Appl. Phys. Lett. 71: 2761–2763.
Chen, G., 1997, Size and interface effects on thermal conductivity of superlattices and periodic thin-film structures, J. Heat Transfer 119: 220–229.
Costela, A., Garciamoreno, I., Florido, F., Figuera, J. M., Sastre, R., Hooker, S. M., Cashmore, J. S., and Webb, C. E., 1995, Laser-ablation of polymeric materials at 157 nm, J. Appl. Phys. 77: 2343–2350.
Deno, H., Sugiyama, S., Kakudate, Y., Yoshida, M., and Fujiwara, S., 1996, VUV ablation of polymers by emission from gas-puff Z-pinch plasmas, Appl. Surf. Sci. 96–8: 563–568.
Dyer, P. E., 2003, Excimer laser polymer ablation: twenty years on, Appl. Phys. A: Mater. Sci. Process. 77: 167–173.
Fedorenko, A. I., Pershin, Yu. P., Poltseva, O. V., Ponomarenko, A. G., Sevryukova, V. S., Voronov, D. L., and Zubarev, E. N., 2001, Structure of Sc/Si multilayer mirrors in as-deposited state and after annealing, J. X-Ray Sci. Technol. 9: 35–42.
Fiedorowicz, H., Bartnik, A., Bittner, M., Juha, L., Krasa, J., Kubat, P., Mikolajczyk, J., and Rakowski, R., 2004, Micromachining of organic polymers by direct photo-etching using a laser plasma X-ray source, Microelectron. Eng. 73–74: 336–339.
Grisham, M., Vaschenko, G., Menoni, C. S., Rocca, J. J., Pershyn, Yu. P., Zubarev, E. N., Voronov, D. L., Sevryukova, V. A., Kondratenko, V. V., Vinogradov, A. V., and Artioukov., I. A., 2004, Damage to extreme-ultraviolet Sc/Si multilayer mirrors exposed to intense 46.9-nm laser pulses, Opt. Lett. 29: 620–622.
Haglund, Jr., R. F., 1996, Microscopic and mesoscopic aspects of laser-induced desorption and ablation, Appl. Surf. Sci. 96–8, 1–13.
Holmes-Siedle, A., and Adams, L., 2002, Handbook of Radiation Effects, 2nd ed., Oxford University Press, Oxford, p. 569.
Juha, L., Krasa, J., Präg, A., Cejnarova, A., Chvostova, D., Rohlena, K., Jungwirth, K., Kravarik, J., Kubes, P., Bakshaev, Yu. L., Chernenko, A. S., Korolev, V. D., Tumanov, V. I., Ivanov, M. I., Bernardinello, A., Ullschmied, J., and Boody, F. P., 2002a, Ablation of poly(methyl methacrylate) by a single pulse of soft X-rays emitted from Z-pinch and laser-produced plasmas, Surf. Rev. Lett. 9: 347–352.
Juha, L., Präg, A. R., Krasa, J., Cejnarova, A., Kralikova, B., Skala, J., Chvostova, D., Krzywinski, J., Andrejczuk, A., Jurek, M., Klinger, D., Sobierajski, R., Fiedorowicz, H., Bartnik, A., Pína, L., Kravarik, J., Kubes, P.,. Bakshaev, Yu. L, Chernenko, A. S., Korolev, V. D., Tumanov, V. I., Ivanov, M. I., Scholz, M., Ryc, L., Tomaszewski, K., Viskup, R., and Boody, F. P., 2002b, Ablation of Organic Polymers and Elemental Solids Induced by Intense XUV Radiation, in: X-ray Lasers: 2002, J. J. Rocca, J. Dunn, and S. Suckewer, eds., AIP Conf. Proc. 641, pp. 504–509.
Juha, L., Bittner, M., Chvostova, D., Krasa, J., Otcenasek, Z., Präg, A. R., Ullschmied, J., Pientka, Z., Krzywinski, J., Pelka, J. B., Wawro, A., Grisham, M. E., Vaschenko, G., Menoni, C. S., and Rocca., J. J., 2005a, Ablation of organic polymers by 46.9-nm-laser radiation, Appl. Phys. Lett. 86, 034109.
Juha, L., Bittner, M., Chvostova, D., Krasa, I, Kozlova, M., Polan, J., Prag, A. R., Rus, B., Stupka, M., Feldhaus, J., Letal, V., Otcenasek, Z., Krzywinski, J., Pelka, J. B., Andrejczuk, A., Sobieraiski, R., Ryc, L., Boody, F. P., Fiedorovicz, H., Bartnik, A., Mikolajczyk, J., Rakowski, R., Kubat, P., Pina, L., Horvath, M., Grisham, M. E., Vaschenko, G. O., Menoni, C. S., and Rocca, J. J., 2005b, Short-wavelength ablation of molecular solids: pulse duration and wavelength effects, J. Microlithography, Microfabrication, and Microsystems 4: 033007.
Katoh, T., and Zhang, Y., 1998, High aspect ratio micromachining by synchrotron radiation direct photo-etching, Microsyst. Technol. 4: 135–138.
Lapczyna, M., and Stuke, M, 1998, Direct fabrication of micro mesas by VUV laser ablation of polymers: PMMA (polymethylmethacrylate), Appl. Phys. A: Mater. Sci. Process. 66: 473–475.
Lee, S. K., Chang, W. S., and Na, S. J., 1999, Numerical and experimental study on the thermal damage of thin Cr films induced by excimer laser irradiation, J. Appl. Phys. 86: 4282–4289.
Leguern, F., André, J.-M., Lebreton, J.-P., Dutrannoy, J.-L., Chauvineau, J.-P., Krastev, K.,. Larcade, J.-L., Friart, D., Nazet, C., and Barchewitz, R., 1997, Experimental study and simulation of the damage induced to various multilayer interferential mirrors by soft X-ray plasma-laser sources, J. X-Ray Sci. Technol. 7: 271–283.
Lippert, T., and Dickinson, J. T., 2003, Chemical and spectroscopic aspects of polymer ablation: special features and novel directions, Chem. Rev. 103: 453–485.
Lukashenko, G. M, Polotskaya, R. I., and Sidorko, V. R., 1992, Thermodynamic properties of scandium, lanthanum, neodymium, and gadolinium silicides and germanides, J. Alloys Compounds 179: 299–305.
Macchietto, C. D., Benware, B. R., and Rocca, J. J., 1999, Generation of millijoule-level soft-x-ray laser pulses at a 4-Hz repetition rate in a highly saturated tabletop capillary discharge amplifier, Opt. Lett. 24: 1115–1117.
MacGowan, B. J., Mrowka, S., Barbee, Jr., T. W., DaSilva, L. B., Eder, D. C., Koch, J. A., Pan, L. S., Turner, J. A., Underwood, J. H., and Young, P. E., 1992, Investigation of damage to multilayer optics in x-ray laser cavities: W/C, WRe/C, WC/C, stainless-steel/C, and Cr3C2/C mirrors, J. X-Ray Sci. Technol. 3: 231–282.
Maida, O., Kohma, N., Ueno, M., Shibuya, A., Kanashima, T., Okuyama, M., and Ohashi, H., 2001, Evaporation and expansion of poly-tetra-fluoro-ethylene induced by irradiation of soft X-rays from a figure-8 undulator, Jpn. J. Appl. Phys., Part 1 40: 2435–2439.
Pugachev, A.T., Churakova, N.P., and Volkov, Yu. A., 1982, Heat conduction of gold thin films in the temperature interval of 80 to 300 K, Poverkhnost. Fizika, khimiia, mekhanika 9: 149.
Riedel, D., and Castex, M. C., 1999, Effective absorption coefficient measurements in PMMA and PTFE by clean ablation process with a coherent VUV source at 125 nm, Appl. Phys. A: Mater. Sci Process. 69: 375–380.
Rocca, J. J., Shlyaptsev, V. N., Tomasel, F.G., Cortazar, O. D., Hartshorn, D., Chilla, J. L. A., 1994, Demonstration of a discharged pumped table-top soft-x-ray laser, Phys. Rev. Lett. 73: 2192–2195.
Rocca, J. J., Clark, D.P., Chilla, J. L. A., Shlyaptsev, V. N., 1996, Energy extraction and achievement of the saturation limit in a discharge-pumped table-top soft x-ray amplifier, Phys. Rev. Lett. 77: 1476–1479.
Sobierajski, R. J., Krzywinski, J., Andrejczuk, A., Faatz, B., Felten, F., Jacobi, S., Juha, L., Jurek, M., Kauch, A., Klinger, D., Pelka, J. B., Saldin, E., Schneidmiller, E., Sikora, M., Steeg, B., and Yurkov, M., 2003, Free Electron Lasers 2002, Argonne, edited by K.-J. Kim, S. V. Milton, and E. Gluskin, Elsevier, Amsterdam, p. II–77.
Srinivasan, R., and Braren, B., 1989, Ultraviolet laser ablation of organic polymers, Chem. Rev. 89: 1303–1316.
Srinivasan, R., 1994, Laser Ablation: Principles and Applications, J. C. Miller, ed., Springer, Berlin, p. 107.
Uspenskii, Yu. A., Levashov, V. E., Vinogradov, A. V., Fedorenko, A. I., Kondratenko, V.V., Pershin, Y. P., Zubarev, E. N., and Fedotov, V. Y., 1998, High-reflectivity multilayer mirrors for a vacuum-ultraviolet interval of 35–50 nm, Opt. Lett. 23: 771–773.
Voronov, D. L., Zubarev, E. N., Kondratenko, V. V., Penkov, A. V., Pershin, Y. P., Ponomarenko, A. G., Artioukov, I. A., Vinogradov, A. V., Uspenskii, Y. A., and Seely, J. F., 2002, Thermoresistive multilayer mirrors with antidiffusion barriers for work at the wavelengths 40–50 nm, in: X-ray Lasers 2002, J. J. Rocca, J. Dunn, and S. Suckewer, eds., AIP Conf. Proc. 641, pp. 575–582.
Yaakobi, B., Kim, H., Soures, J. M., Deckman, H. W., and Dunsmuir, J., 1983, Submicron x-ray lithography using laser-produced plasma as a source, Appl. Phys. Lett. 43: 686–688.
Yu, L. H., DiMauro, L., Doyuran, A., Graves, W. S., Johnson, E. D., Heese, R., Krinsky, S., Loos, H., Murphy, J. B., Rakowsky, G., Rose, J., Shaftan, T., Sheehy, B., Skaritka, J., Wang, X. J., and Wu, Z., 2003, First ultraviolet high-gain harmonic-generation free-electron laser, Phys. Rev. Lett. 91: 074801.
Yurkov, M. V., 2003, Development of free-electron x-ray lasers on the TESLA test accelerator (DESY, Germany), At. Energy 94: 108–112.
Zhang, X., Jacobsen, C., Lindaas, S., and Williams, S., 1995, Exposure strategies for polymethyl methacrylate from in situ x-ray absorption near edge structure spectroscopy, J. Vac. Sci. Technol. B 13: 1477–1483.
Zhang, Y., Katoh, T., Washio, M., Yamada, H., and Hamada, S., 1995, High aspect ratio micromachining Teflon by direct exposure to synchrotron radiation, Appl. Phys. Lett. 67: 872–874.
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Grisham, M.E. et al. (2007). Materials Modification with Intense Extreme Ultraviolet Pulses from a Compact Laser. In: Phipps, C. (eds) Laser Ablation and its Applications. Springer Series in Optical Sciences, vol 129. Springer, Boston, MA. https://doi.org/10.1007/978-0-387-30453-3_21
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