Abstract
In this chapter we describe and discuss Kelvin probe force microscopy (KPFM), a scanning probe microscopy technique designed to obtain laterally resolved work function images by measuring the electrostatic forces between probe and sample surface. By operating the microscope in ultrahigh vacuum, even absolute work function measurements with very high lateral and energy resolution can be realized.
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M. Nonnenmacher, M. P. O’Boyle, and H. K. Wickramasinghe, Appl. Phys. Lett. 58, 2921 (1991).
Y. Leng, C. C. Willams, L. C. Su, and G. B. Stringfellow, Appl. Phys. Lett. 66, 1264 (1995).
S. Saraf, R. Shikler, J. Yang, and Y. Rosenwaks, Appl. Phys. Lett. 80, 2586 (2002).
Y. Rosenwaks, R. Shikler, T. Glatzel, and S. Sadewasser, Phys. Rev. B 70, 085320 (2004).
M. Shvebelman, P. Urenski, R. Shikler, G. Rosenman, M. Molotskii and Y. Rosenwaks, Appl. Phys. Lett. 80, 1806 (2002).
T. Glatzel, H. Hoppe, N. S. Sariciftci, M. C. Lux-Steiner, and M. Komiyama, Jap. J. Appl. Phys. 44, 5370 (2005).
A. Kikukawa, S. Hosaka, and R. Imura, Appl. Phys. Lett. 66, 3510 (1995).
A. Chavez-Pirson, O. Vatel, M. Tanimoto, H. Ando, H. Iwamura and H. Kanbe, Appl. Phys. Lett. 67, 3069 (1995).
T. Mizutani, M. Arakawa, and S. Kishimoto, IEEE Elec. Dcv. Lett 18, 423 (1997).
M. Arakawa, S. Kishimoto, and T. Mizutani, Jap. J. Appl. Phys. 36, 1826 (1997).
R. Shikler, T. Meoded, N. Fried, B. Mishori, and Y. Rosenwaks, J. Appl. Phys. 86, 107 (1999).
R. Shikler, T. Meoded, N. Fried, and Y. Rosenwaks, Appl. Phys. Lett. 74, 2972 (1999).
T. Glatzel, D. F. Marrón, T. Schedel-Niedrig, S. Sadewasser, and M. C. Lux-Steiner, Appl. Phys. Lett. 81, 2017 (2002).
S. Sadewasser, T. Glatzel, M. Rusu, A. Jäger-Waldau, and M. C. Lux-Steiner, Appl. Phys. Lett. 80, 2979 (2002).
L. Bürgi, H. Sirringhaus, and R. Friend, Appl. Phys. Lett. 80, 2913 (2002).
T. D. Krauss, S. O’Brien, and L. E. Brus, J. Phys. Chem. B 105, 1725 (2001).
O. Douhéret, S. Anand, T. Glatzel, K. Maknys, and S. Sadewasser, Appl. Phys. Lett. 85, 5245 (2004).
S. Kitamura, K. Suzuki, M. Iwatsuki, and C. B. Mooney, Appl. Surf. Sci. 157, 222 (2000).
K. Okamoto, Y. Sugawara, and S. Morita, Appl. Sur. Sci. 188, 381 (2002).
N. Duhayon, P. Eyben, M. Fouchier, T. Clarysse, W. Vandervorst, D. Alvarez, S. Schoemann, M. Ciappa, M. Stangoni, P. Formanek, V. Raineri, F. Gian-nazzo, D. Goghero, Y. Rosenwaks, R. Shikler, S. Saraf, S. Sadewasser, N. Barreau, Th. Glatzel, M. Verheijen, S.A.M. Mentink, M. von Sprekselen, T. Maltezopoulos, R. Wiesendanger and L. Hellemans, J. Vac. Sci. Tech. B 22, 385 (2004).
C. C. Williams, Annual Review of Materials Science 29, 471 (1999).
P. De Wolf, M. Geva, T. Hantschel, W. Vandervorst, and R. B. Bylsma, Appl. Phys. Lett. 73, 2155 (1998).
S. Hudlet, M. S. Jean, B. Roulet, J. Berger, and C. Guthmann, J. Appl. Phys. 77, 3308 (1995).
A. K. Henning, T. Hochwitz, J. Slinkman, J. Never, S. Hoffmann, P. Kaszuba and C. Daghlian, J. Appl. Phys. 77, 1888 (1995).
F. Giessibl, and M. Tortonese, Appl. Phys. Lett. 70, 2529 (1997).
F. Giessibl, Phys. Rev. B 56, 16010 (1997).
F. Giessibl, H. Bielefcldt, S. Hembacher, and J. Mannhart, Appl. Surf. Sci. 140, 352 (1999).
D. Abraham, C. Williams, J. Slinkman, and H. Wickramasinghe, J. Vac. Sci. Technol. B 9, 703 (1991).
A. Kikukawa, S. Hosaka, and R. Imura, Rev. Sci. Instrum. 67, 1463 (1996).
C. Sommerhalter, T. W. Matthes, T. Glatzel, A. Jäger-Waldau, and M. C. Lux-Steiner, Appl. Phys. Lett. 75, 286 (1999).
C. Sommerhalter, T. Glatzel, T. Matthes, A. Jäger-Waldau, and M. C. Lux-Steiner, Appl. Surf. Sci. 157, 263 (2000).
S. Kitamura, K. Suzuki, and M. Iwatsuki, Jpn. J. Appl. Phys. 37, 3765 (1998).
S. Kitamura, K. Suzuki, and M. Iwatsuki, Appl. Surf. Sci. 140, 265 (1999).
T. Albrecht, P. Grütter, D. Horne, and D. Rugar, J. Appl. Phys. 69, 668 (1991).
T. Glatzel, S. Sadewasser, and M. C. Lux-Steiner, Appl. Surf. Sci. 210, 84 (2003).
T. Glatzel, S. Sadewasser, R. Shikler, Y. Rosenwaks, and M. C. Lux-Steiner, Mat. Sci. Engineer. B 102, 138 (2003).
T. Fukuma, K. Kimura, K. Kobayashi, K. Matsushige, and H. Yamada, Appl. Phys. Lett. 85, 6287 (2004).
H. Jacobs, P. Leuchtmann, O. J. Homan, and A. Stemmer, J. Appl. Phys. 84, 1168 (1998).
T. Hochwitz, A. Henning, C. Levey, C. Daghlian, and J. Slinkman, J. Vac. Sci. Technol. B 14, 457 (1996).
S. Hudlet, M. S. Jean, C. Guthmann, and J. Berger, Eur. Phys. J. B 2, 5 (1998).
S. Belaidi, F. Lebon, P. Girard, G. Leveque, and S. Pagano, Appl. Phys. A 66, 239 (1998).
H. O. Jacobs and A. Stemmer, Surf. Interface Anal. 27, 361 (1999).
R. Shikler, PhD thesis, Tel-Aviv University, 2003.
A. K. Jain, Fundamentals of Digital Image Processing (Prentice Hall, 1989).
S. V. Kalinin, D. A. Bonnell, M. Freitag, and A. T. Johnson, Appl. Phys. Lett. 81, 754 (2002).
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Glatzel, T., Lux-Steiner, M., Strassburg, E., Boag, A., Rosenwaks, Y. (2007). Principles of Kelvin Probe Force Microscopy. In: Kalinin, S., Gruverman, A. (eds) Scanning Probe Microscopy. Springer, New York, NY. https://doi.org/10.1007/978-0-387-28668-6_5
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DOI: https://doi.org/10.1007/978-0-387-28668-6_5
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