This is a preview of subscription content, log in via an institution.
Preview
Unable to display preview. Download preview PDF.
Abbreviations
- A:
-
Ion bombarded area
- A:
-
Electron affinity
- A BM :
-
Preexponantial factor of Born-Mayer potential
- A O :
-
Data acquisition area
- A d :
-
Empirical constant
- δA:
-
Fractional damaged area
- A′:
-
Rate constant in Auger neutralization
- a′:
-
Inverse distance
- a BM :
-
Characteristic distance of Born-Mayer potential
- B:
-
Magnetic field strength
- B i :
-
Conversion factor
- b:
-
Empirical exponent
- b i :
-
Characteristic factor in AES
- c:
-
Velocity of light
- ci, CM:
-
Concentration (atomic fraction) of species i or M
- cç, cad:
-
Apparent concentration due to cross-contamination and residual gas adsorption, respectively
- D:
-
Distance between atoms in a crystal direction
- D:
-
Diffusion constant
- D S :
-
Sample-electrode spacing
- d:
-
Drift length or distance from sample
- E 0 :
-
Energy of primary ion or electron
- E n :
-
Energy deposition into nuclear motion
- E d :
-
Threshold displacement energy
- E dp :
-
Mean displacement energy
- E f :
-
Focusing energy
- E p :
-
Most probable energy
- E ri :
-
Energy of (back-)scattered ion
- E R :
-
Energy of reflected ions
- ES, Ei:
-
Energy of sputtered ions
- δEσ:
-
Total energy loss to surrounding lattice
- e:
-
Elementary charge
- F ij :
-
Isotope fractionation ratio
- F n :
-
Nuclear energy deposition per unit depth
- f:
-
Undamaged fraction of bombarded area
- f i :
-
Fraction of atoms in bonding state i
- g:
-
Instrumental factor
References
W.R. Grove: Phil. Trans. Roy. Soc. London 142, 87 (1852)
J. Plücker: Pogg. Ann. 103, 88 (1858)
A.W. Wright: Am. J. Sci. Arts 13, 49 (1877)
G.K. Wehner, G.S. Anderson: In Handbook of Thin Filin Technology, ed. by L.I. Maissel, R. Glang (McGraw-Hill, New York 1970), Chap. 3
L.M. Reiber, J. Lantaires: Le Vide 168 (1973)
W.D. Westwood: In Proy. Surf. Sci. 7, ed. by S.G. Davison (Pergamon Press, Oxford 1976) p. 71
R. Glang: In Handbook of Thin Film Technology, ed. by L.I. Maissel, R. Glang (McGraw-Hill, New York 1970) p. 3
C.F. Powell: In Vapor Deposition, ed. by C.F. Powell, J.H. Oxley, J.M. Blocher, Jr. (Wiley, New York 1966) Chap. 9, p. 249
A.R. Reinberg: In Annual Review of Material Science, Vol. 9, ed. by R.A. Huggins (Annual Reviews, Inc., Palo Alto 1979) p. 341
J.R. Salem, F.O. Sequeda, J. Duran, W.Y. Lee: J. Vac. Sci. Technol. A 4, 369 (1986)
G.K. Wehner, G.S. Anderson: In Handbook of Thin Film Technology, ed. by L.I. Maissel, R. Glang (McGraw-Hill, New York 1970) Chap. 3, p. 1
L.M. Reiber: Revue Technique Thompson-CSF 4 (2) (1972)
E. Groshart: Metal Finishing 71, 44 (1973)
E.D. McClanahan, N. Laegreid, R. Busch, E.N. Greenwell, R.W. Moss, J.W. Patten, M.A. Bayne: Government-Industry Workshop on Alternatives for Cadmium Electroplating in Metal Finishing, Gaithersburg, Maryland (1977)
B.J. Shaw, R.P. Miller: U.S. Patent, 3,918,100 (1975)
M.A. Bayne, R.W. Moss, E.D. McClanahan: Thin Solid Films 54, 327 (1978) 63, 137 (1979)
M. Kitabatake, K. Wasa: J. Vac. Sci. Technol. A 6, 1793 (1988)
G.K. Wehner, Y.H. Kim: Appl. Phys. Lett. 52, 1187 (1987)
R. Behrisch (ed.): Sputtering by Particle Bombardment I, Topics Appl. Phys., Vol. 47 (Springer, Berlin, Heidelberg 1982)
R. Behrisch (ed.): Sputtering by Particle Bombardment II, Topics Appl. Phys., Vol. 52 (Springer, Berlin, Heidelberg 1983)
B. Chapman: Glow Discharge Processes-Sputtering and Plasma Etching (Wiley, New York 1980)
P.D. Townsend, J.C. Kelly, N.E.W. Hartley: Ion Implantation, Sputtering, and Their Applications (Academic, London, 1976)
R.V. Stuart: Vacuum Technology, Thin Films, and Sputtering: An Introduction (Academic, New York 1983)
H.D. Hagstrum: J. Vac. Sci. Technol. 12, 7 (1975)
H.H. Andersen, H.L. Bay: In Sputtering by Particle Bombardment I, Topics Appl. Phys., Vol. 47, ed. by R. Behrisch (Springer, Berlin, Heidelberg 1982) p. 165
N. Laegreid, G.K. Wehner: J. Appl. Phys. 32, 356 (1961)
H. Oechsner: Z. Physik 261, 37 (1973)
G.K. Wehner, D. Rosenberg: J. Appl. Phys. 31, 177 (1960)
B.M. Gurmin, Y.A. Rhyzon, I.I. Shkarban: Bull. Acad. Sci. USSR, Phys. Ser. (USA) 33, 752 (1969)
H.H. Andersen, B. Stenum, T. Sorensen, H.J. Whitlow: Nucl. Instrum. and Methods in Physics Research B 6, 459 (1985)
J.B. Bindell, T.C. Tisone: Thin Solid Films 23, 31 (1974)
J. Dembowski, H. Oechsner, Y. Yamamura: Nucl. Instrum. and Methods in Physics Research B 18, 464 (1987)
T. Motohiro, Y. Taga: Surf. Sci. 118, 66 (1982)
K. Meyer, I.K. Schuler, C.M. Falco: J. Appl. Phys. 50, 5803 (1981)
P. Sigmund: Nucl. Instrum and Methods, B 18, 375 (1987)
G. Betz, G.K. Wehner: In Sputtering by Particle Bombardment II, Topics, Appl. Phys., Vol. 52, ed. by R. Behrisch (Springer, Berlin, Heidelberg 1983), p. 16
L.I. Maissel: In Handbook of Thin Film Technology, ed. by L.I. Maissel, R. Glang (McGraw Hill, NewYork 1970) Chap. 4, p. 39
R.R. Olson, M.E. King, G.K. Wehner: J. Appl. Phys. 50, 3677 (1979)
P. Sigmund: In Sputtering by Particle Bombardment 1, Topics Appl. Phys., Vol. 47, ed. by R. Behrisch (Springer, Berlin, Heidelberg 1982) p. 15
J. Bohdansky, H. Linder, E. Hechtl, A.P. Martinelli, J. Roth: Nucl. Instrum. and Methods in Physics Research B 18, 509 (1987)
G.K. Wehner: Phys. Rev. 102, 690 (1956)
J.J. Cuomo, S.M. Rossnagel: Nucl. Instrum. and Methods in Physics Research B 19/20, 963 (1987)
E. Krikorian, R.J. Sneed: J. Appl. Phys. 37, 3665 (1966)
S.D. Dahlgren: Met. Trans. 1, 3095 (1970)
W.T. Pawlewicz and R. Busch: Thin Solid Films 63, 251 (1979)
R. Harrop, P.J. Harrop: Thin Solid Films 3, 109 (1969)
T. Spalvins: Thin Solid Films 53, 285 (1978)
S. Flugge (ed.): Encyclopedia of Physics, Vol. XXI (Springer, Berlin, Göttingen, Heidelberg 1956)
S. Flugge (ed.): Encyclopedia of Physics, Vol. XXII (Springer, Berlin, Göttingen, Heidelberg 1956)
W.D. Westwood: J. Vac. Sci. Technol. 15, 1 (1978)
L.I. Maissel: In Physics of Thin Films, ed. by G. Hass and R.E. Thun (Academic, New York 1966) p. 92
F. Paschen: Wied. Ann. 37, 69 (1889)
R.G. Johanson, W.G. Carruthers: J. Vac. Sci. Technol. A 4, 550 (1986)
E. Kay: Trans. Materials Research Corporation Conf. and School, Pebble Beach, California (1969) p. 1
H.C. Cooke, C.W. Covington, J.F. Libsch: Trans. Met. Soc. AIME 236, 314 (1966)
V. Hoffman: Electron, Pack. and Prod. 13 (11) 81 (1973)
S.D. Dahlgren, D.M. Kroeger: J. Appl. Phys. 44, 5595 (1973)
L.T. Lamont, Jr.: Solid State Technol. 22, 107 (1979)
L.I. Maissel: U.S. Patent 3,294,661 (1966)
L.I. Maissel, J.H. Vaughn: Vacuum 13, 421 (1963)
R.D. Bland: Sandia Tech. Memo SC-TM-71-0526 (1971)
H. Shimizu, M. Ono, K. Nakayama: J. Appl. Phys. 46, 460 (1975)
H.F. Winters, E.E. Horne, E.E. Donaldson: J. Chem. Phys. 41, 2766 (1964)
E.V. Kornelsen: Can. J. Phys. 42, 364 (1964)
G. Carter: In Ion Bombardment of Solids (Elsevier, New York 1968) p. 185
J.L. Vossen, W. Kern (eds.): Thin Film Processes (Academic, New York 1978) p. 54
J.M.E. Harper, J.J. Cuomo, R.J. Gambino, H.R. Kaufman: Nucl. Instrum. and Methods in Physics Research B 7/8, 886 (1985)
B.L. Flur: Proc. Intern. Mag. Conf., 2.4-1 Washington, D.C. (1965)
A.J. Griest, B.L. Flur: J. Appl. Phys. 38, 1431 (1967)
D.M. Mattox: SLA-73-0619, Sandia National Laboratory, Albuquerque, New Mexico (1973)
P.R. Segatto: J. Vac. Sci. Technol. 6, 368 (1969)
H.J. Spitzer: Presented at the 9th Annual Symposium, New Mexico Chapter of the Am. Vac. Soc., Albuquerque, New Mexico (1973)
E.L. Hollar, F.N. Rebarchik, D.M. Mattox: J. Electrochem. Soc. 117, 1461 (1970)
J.W. Patten: Ph.D. Thesis, Washington State University (1975)
S.D. Dahlgren: J. Appl. Phys. 41, 5004 (1970)
C. Deshpandey, L. Holland: Thin Solid Films 96, 265 (1982)
R.W. Knoll, E.R. Bradley: Mat. Res. Soc. Symp. Proc. 30, 235 (1984)
T. Hata, K. Toriyama, J. Kawahara, M. Ozaki: Thin Solid Film 108, 325 (1983)
D. Buhling, L. Michalowsky: Le Vide 185, 185 (1976)
K.Y. Ahn, M. Wittmer, C.Y. Ting: Thin Solid Films 107, 45 (1983)
W.D. Sproul: Thin Solid Films 107, 141 (1983)
S. Alertovitz, J.A. Woollam, L. Kammerdiner, H-L. Luo, C. Martin: U.S. NASA Tech. Memo, NASA TM X-73620 (1977)
T. Spalvins: Thin Solid Films 96, 17 (1982)
W.T. Pawlewicz, P.M. Martin, D.D. Hays, I.B. Mann: In Optical Thin Films, Proceedings of SPIE (The International Society of Optical Engineering), ed. by R.I. Seddon, 325, 105 (1982)
R. Kelly, N.Q. Lam: Radiat. Eff. 19, 39 (1973)
L. Holland: The Vacuum Deposition of Thin Films (Wiley, New York 1956) p. 434
P.J. Burkhardt, L.V. Gregor: Trans. 19th Natl. Vac. Symp., Am. Vac. Soc. (1967), p. 31
Bomchil, F. Buiquez, A. Monfret, S. Galzin: Thin Solid Films 47, 235 (1977)
T. Abe, T. Yamashina: Thin Solid Films 30, 19 (1975)
F. Shinoki, A. Itoh: J. Appl. Phys. 46, 3381 (1975)
J. Hrbek: Thin Solid Films 42, 185 (1977)
B. Goranchev, V. Orlinov, V. Popova: Thin Solid Films 33, 173 (1976)
N. Schwartz: In Trans. 10th Natl. Vac. Symp., Am. Vac. Soc. (Macmillan, New York 1963)
E. Hollands, D.S. Campbell: J. Mater. Sci. 3, 544 (1968)
H.F. Winters, D.L. Raimondi, D.E. Horne: J. Appl. Phys. 40, 2996 (1969)
S. Schiller, U. Heisig, K. Steinfelder, J. Strümpfel: Thin Solid Films 63, 369 (1979)
O. Fiedler, B. Schöneich, G. Reisse, H.J. Erler: Wiss. Z. d. Techn. Hochsch. Karl-Marx-Stadt, 12, 483 (1970)
D. Brzezinska: In Works of the Industrial Institute of Electronics, 12(3) 95 (1971)
T.I. Putner, G.N. Jackson: Sprechsaal Keram Glass. Email. Silikate 105, 20 (1972)
J.W. Nickerson, R. Moseson: In Trans. 3rd Intern. Vac. Cong., ed. by H. Adams (Pergamon Press, New York 1967) p. 625
E.C. Muly, A.J. Aronson: J. Vac. Sci. Tech. 6, 128 (1969)
S.M. Rossnagel: J. Vac. Sci. Technol. A 6, 19 (1988)
F.E. Terman: Electronic and Radio Engineering, 4th ed. (McGraw-Hill, Toronto 1955) p. 173
N. Laegreid, G.K. Wehner, B. Meckel: J. Appl. Phys. 30, 374 (1959)
E.D. McClanahan, R.W. Moss: U.S. Patent 4,046,666 (1977)
R.W. Moss, M.D. Merz: J. Vac. Sci. Technol. A 3, 2694 (1985)
J.D. Cobine: Gaseous Conductors (Dover, New York 1958) p. 109
D.A. Wright: Proc. Inst. Elec. Engrs. 100, 125 (1953)
E.D. McClanahan: Presented at the Am. Vac. Soc. Thin Film Division Topical Symposium on Sputtering, San Diego, California (April 6–8, 1984)
R.V. Stuart, G.K. Wehner, G.S. Anderson: J. Appl. Phys. 40, 803 (1969)
G.S. Anderson, W.N. Mayer, G.K. Wehner: J. Appl. Phys. 33, 2991 (1962)
D.P. Davidse, L.I. Maissel: J. Appl. Phys. 37, 574 (1966)
P.D. Davidse, L.I. Maissel: In Trans. 3rd Intern. Vac. Cong., ed. by H. Adam (Pergamon, New York 1967) p. 651
R.B. McDowell: SCP and Solid State Techn. 15, 23 (1969)
H. Norstrom: Vacuum 29, 341 (1979)
G. Siegle: MRV Metallpraxis/Oberflächentechnik, p. 247 (1972)
J.J. Bessot: Thin Solid Films 32, 19 (1976)
G. Gorinas, Cit-Alcatel: French Patent 74 18999 (1974)
F.M. Penning: U.S. Patent 2,146,025 (1939)
E. Kay: J. Appl. Phys. 34, 760 (1963)
L.I. Maissel: In Handbook of Thin Film Technology, ed. by L.I. Maissel, R. Glang (McGraw Hill, New York 1970) Chap. 4, p. 9
C.F. Weston: In Cold Cathode Glow Discharge Tubes (ILIFFE Books, London 1968) Chap. 3, p. 108
J.A. Thornton: J. Vac. Sci. Technol. 15, 171 (1978)
J.A. Thornton, A.S. Penfold: In Thin Film Processes, ed. by J.L. Vossen, W. Kern (Academic, New York 1978) p. 77
F.M. Penning, J.H.A. Moubis: Proc. Koninkl. Ned. Akad. Wetenschap. 43, 41 (1940)
F.M. Penning: Physica 3, 873 (1936)
U. Heisig, K. Goedicke, S. Schiller: Proc. 7th Intern. Symp. Electron and Ion Beam Sci. and Tech., Washington D. C. 976 (Electrochem. Soc., Princeton, New Jersey 1976) p. 129
N. Hosakawa, T. Tsukada, T. Misumi: J. Vac. Sci. Technol. 14, 143 (1977)
A.S. Penfold, J.A. Thornton: U.S. Patents 4,041,353, 3,995,187, 4,030,996, 4,031,424, (1977); U.S. Patent 3,884,793 (1975); A.S. Penfold: U.S. Patent 3,919,678 (1975)
K.I. Kirov, N.A. Ivanov, E.D. Atanasova, G.M. Minchev: Vacuum 26, 237 (1976)
F.R. Arcidiacono: Proc. 27th Electron. Components Conf. (IEEE, New York 1977) p. 232
K. Wasa, S. Hayakawa: Rev. Sci. Instrum. 40, 693 (1969)
J.A. Thornton, J. Tabock, D.W. Hoffman: Thin Solid Films 64, 111 (1979)
D.W. Hoflman: Thin Solid Films 107, 353 (1983)
R.L. Cormia, P.S. McLeod, N.K. Tsujimoto: In Proc. 6th Intern. Conf. on Electron and Ion Beam Sci. and Tech., ed. by R. Bakish (Electrochem. Soc. Inc., Princeton 1974) p. 248
S. Schiller, U. Heisig, K. Goedicke: Thin Solid Films 40, 327 (1977)
S. Schiller, G. Beister, E. Buedke, H.J. Becker, H. Schicht: Thin Solid Films 96, 113 (1982)
R.K. Waits: In Thin Film Processes, ed. by J.C. Vossen, W. Kern (Academic, New York 1978) p. 131
Sloan Tech. Corp. Brochure, T-133[A]-5M-677
P.S. McLeod: U.S. Patent 3,956,093 (1976)
Editor information
Rights and permissions
Copyright information
© 1991 Springer-Verlag
About this chapter
Cite this chapter
McClanahan, E.D., Laegreid, N. (1991). Production of thin films by controlled deposition of sputtered material. In: Behrisch, R., Wittmaack, K. (eds) Sputtering by Particle Bombardment III. Topics in Applied Physics, vol 64. Springer, Berlin, Heidelberg. https://doi.org/10.1007/3540534288_21
Download citation
DOI: https://doi.org/10.1007/3540534288_21
Published:
Publisher Name: Springer, Berlin, Heidelberg
Print ISBN: 978-3-540-53428-0
Online ISBN: 978-3-540-46881-3
eBook Packages: Springer Book Archive