Abstract
The structure properties of thin gold films deposited on glass substrates are in principle similar to the silver films described in the last chapter. The main difference, however, is the fact that the crystal growth as well as the island formation occur at higher temperatures for gold films. First, we will concentrate on gold films deposited at room temperature and then annealed for 1 h at higher temperatures, all other preparation parameters have been kept as comparable as possible to the case of silver.
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Wißmann, P., Finzel, HU. (2007). The Effect of Annealing on the Electrical Resistivity of Thin Gold Films. In: Electrical Resistivity of Thin Metal Films. Springer Tracts in Modern Physics, vol 223. Springer, Berlin, Heidelberg. https://doi.org/10.1007/3-540-48490-6_4
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