Spectro-microscopy by TEM-SEM

  • K. Yagi
  • Y. Tanishiro
  • H. Minoda
Conference paper
Part of the Lecture Notes in Physics book series (LNP, volume 588)


Microscope study is one of the basic research methods in materials science. Electron microscopy has been widely used in many fields for many years. There have been various kinds of electron microscopes as shown in Table 1. Except for special cases with use of divergent electric or magnetic field for image magnification system, most of electron microscopes get images either by magnification lenses or by a micro- or nano-probe and its scanning technique. Some instruments can have two or more types of imaging technique (TEM /STEM /SEM, STEM /SEM /SAM, LEEM /PEEM /MEM). The present paper overviews only spectro-microscopy by microscopes underlined in Table 1 (where an incident electron energy is a few tens to a few hundred keV): conventional transmission electron microscope (CTEM, when a nano-probe and its scanning technique is combined, it is called TEM/STEM), STEM (or dedicated STEM), SEM and scanning Auger microscope (SAM). Spectro-microscopy means microscopy where an image is made with use of a part of spectral signals obtained from a specimen.

It is well known that TEM and STEM are equivalent with each other by the reciprocity law as far as we are concerned with elastically scattered electrons. However, it is not so in other cases including inelastically scattered ones. TEM/STEM can be operated ineither mode.


Lattice Fringe Incident Electron Conventional Transmission Electron Microscope Energy Dispersive Spectroscopic Aberration Correction 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.


Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.


  1. 1.
    H.-W. Fink, H. Schmid, H. Krauzer and A. Wierzbicki: Phys. Rev. Lett. 67(1991) 1543 and references there in.CrossRefGoogle Scholar
  2. 2.
    C. Ohsima: Ultramicroscopy 78(1999) 27.CrossRefGoogle Scholar
  3. 3.
    M. Tanaka, M. Terauchi, K. Tsuda, K. Saitoh, T. Honda, K. Tsuno, M. Naruse, T. Tomita and T. Kaneyama: Inst. Phys. Conf. Ser. No 165 (2000) 217.Google Scholar
  4. 4.
    O. L. Krivanek, N. Dellby and A. R. Lupini: Ultramicrosocpy 78 (1999) 1–11.CrossRefGoogle Scholar
  5. 5.
    Y. Takai, Y. Kimura, T. Ikuta, R. Shimizu, Y. Sato, S. Isagozawa and M. Ichihashi: J. Electron Micrsoc. 48 (1999) 879.Google Scholar
  6. 6.
    K. Tsuno, T. Kaneyama, T. Honda, K. Tsuda, M. Terauchi and M. Tanaka: J. Electron Microsc. 46 (1997) 357.Google Scholar
  7. 7.
    O. L. Krivanek, A. J. Gubbens, N. Dellby and L. E. Meyer: Micros. Microanal. Microstruct. 3 (1992) 187.CrossRefGoogle Scholar
  8. 8.
    S. Uhlemann and H. Rose: Optik 96 (1994) 163. M. Ruhle, C. Elasser, C. Scheu and W. Sigle: Phys. Conf. Ser. No 165 (2000) 1.Google Scholar
  9. 9.
    M. Terauchi, M. Tanaka, K. Tsuno and M. Ishida: J. Microsc. 194 (1999) 203.CrossRefGoogle Scholar
  10. 10.
    M. Terauchi, H. Yamamoto and M. Tanaka: J. Electron Microsc. 50 (2001) 101.CrossRefGoogle Scholar
  11. 11.
    D. A. Wollman, K. D. Irwin, G. C. Hilton, L. L. Dulcie, D. E. Newbury and J. M. Martinis: J. Microscopy 188 (1997) 196.CrossRefGoogle Scholar
  12. 12.
    A. Howie: Proc. 39th EMSA Meeting (1981) 186.Google Scholar
  13. 13.
    S. J. Pennycook, B. Rafferty and G. Duscher: Phys. Conf. Ser. No 165 (2000) 243.Google Scholar
  14. 14.
    M. Tanaka, K. Tsuda, M. Terauchi, K. Tsuno, T. Kaneyama, T. Honda and M. Sihida: J. Microsc. 194 (1999) 219.CrossRefGoogle Scholar
  15. 15.
    C. Hebert-Souche, P.-H. Louf, P. Blaha, M. Nelhiebel, J. Luitz, P. Schattschneider, K. Schwarz and B. Jouffrey: Ultramicrscopy 83 (2000) 9.CrossRefGoogle Scholar
  16. 16.
    M. Qian, M. Sarikaya and E. A. Stern: Ultramicroscopy 59(1995) 137.CrossRefGoogle Scholar
  17. 17.
    K. T. Moore, J. M. Howe, D. R. Veblem, T. M. Murray and W. A. Stach: Ultramicroscopy 80 (1999) 221.CrossRefGoogle Scholar
  18. 18.
    K. Suenaga, M. Tence, C. Mory, C. Colliex, H. Kato, T. Okazaki, H. Shinohara, K. Hirahara, S. Bandow, and S. Iijima: Science 290 (2000) 2280.CrossRefGoogle Scholar
  19. 19.
    Hui Gu and M. Ceh: Ultramicroscopy 78 (1999) 221.CrossRefGoogle Scholar
  20. 20.
    Y. Homma, H. Yamaguchi and P. Finnie: Int. Phys. Conf. Ser. No. 164, Microscopy of Semiconductiong Materials 1999, Ed. by A. G. Cullis and R. Beanland, IOP Publishing, Bristol, 1999, pp. 161.Google Scholar
  21. 21.
    M. Matsuyama and K. Koike: J. Electron Microsc. 39(1990) 92.Google Scholar
  22. 22.
    J. H. C. Spence: in Electron Diffraction Technique I(ed. J. M. Cowley, Oxford, 1992), pp465.Google Scholar
  23. 23.
    D. J. Dingley: Electron Microscopy (1998) vol.1 p29 and references there in.Google Scholar
  24. 24.
    N. Yamamoto, H. Sugiyama and A. Toda: Proc. Roy. Soc. Lond. A 452 (1996) 2279.CrossRefGoogle Scholar
  25. 25.
    N. Yamamoto and A. Toda: Scanning Microscopy 9(1995) 669.Google Scholar
  26. 26.
    N. Yamamoto, K. Araya, A. Toda, and H. Sugiyama: Surface and Interface Analysis 30 (2000) 79.Google Scholar
  27. 27.
    D. B. Williams and C. B. Carter: Transmission Electron Microscopy vol. IV: (Plemum Press, New York,1996).Google Scholar
  28. 28.
    J. Tafto and J. C. H. Spence: Ultramicrosocpy 8 (1982) 243CrossRefGoogle Scholar
  29. 29.
    J. C. H. Spence and J. Tafto: J. Microscopy130 (1983) 147.Google Scholar
  30. 30.
    J. A. Eads: J. Electron Microsc. Tech. 1 (1984) 279.CrossRefGoogle Scholar
  31. 31.
    C. J. Rossouw, C. T. Forwood, M. A. Gibson and p. R. Miller: Phil. Mag. A74 (1996) 57.Google Scholar
  32. 32.
    J. Kawai, K. Hayashi and Y. Awakura: J. Phys. Soc. Jpn. 66 (1997) 3337.CrossRefGoogle Scholar
  33. 33.
    T. Fujikawa and J. Kawai: J. Phys. Soc. Jpn. 68 (1999) 4032.CrossRefGoogle Scholar
  34. 34.
    S. Ino, H. Hasegawa, H. Matsumoto and H. Daimon: in “The Structure of Surfaces” (Eds. S. Y. Tong et al., Springer, Berlin, 1991) p334.Google Scholar
  35. 35.
    T. Yamanaka and S. Ino: Jpn. J. Appl. Phys. 35 (1996) 3991.CrossRefGoogle Scholar
  36. 36.
    J. C. H. Spence, G. M. Reese, N. Yamamoto and G. Kurizki: Phil. Mag. B48(1983) L39.Google Scholar
  37. 37.
    G. M. Reese, J. H. C. Spence and N. Yamamoto: Phil. Mag. A49(1984) 697.Google Scholar
  38. 38.
    Y. Tanishiro, K. Okamoto, M. Takeguchi, H. Minoda, T. Suzuki and K. Yagi: J. Electron Microsc. 48 (1999) 837.Google Scholar
  39. 39.
    O. L. Krivanek, Y. Tanishiro, K. Takayanagi and K. Yagi: Ultramicroscopy 11 (1983) 215.CrossRefGoogle Scholar
  40. 40.
    Z. L. Wang: Reflection Electron Microscopy and Spectroscopy for Surface Analysis (1996, Cambridge University Press).Google Scholar
  41. 41.
    Y. Tanishiro, K. Okamoto, T. Suzuki, N. Ishiguro, H. Minoda, H. Miura, K. Yagi and M. Takeguchi: Jpn. J. Appl. Phys. 38(1999) 6540.CrossRefGoogle Scholar
  42. 42.
    T. Suzuki, Y. Tanishiro, H. Minoda, and K. Yagi: Jpn. J. Appl. Phys. 40 (2001) 2527.CrossRefGoogle Scholar

Copyright information

© Springer-Verlag Berlin Heidelberg 2002

Authors and Affiliations

  • K. Yagi
    • 1
  • Y. Tanishiro
    • 1
  • H. Minoda
    • 1
  1. 1.Physics DepartmentTokyo Institute of TechnologyTokyoJapan

Personalised recommendations