Advertisement

Electrodeposition of Multilayered Nanostructures

  • Mürsel Alper
Chapter
Part of the Lecture Notes in Physics book series (LNP, volume 593)

Abstract

Electrodeposition is one of the techniques used to produce nanostructured magnetic multilayers as well as single thin films. We have developed an experimental system to produce nanostructure materials such as metal/metal multilayers and multilayer nanowires by electrodeposition. The properties of such structures may depend on many electrochemical parameters such as the electrolyte concentration, the electrolyte pH, the deposition potentials of metals and the current efficiency. The growth mechanisms and the structural and magnetotransport properties of ferromagnetic multilayers grown by electrodeposition from a single electrolyte are studied.

Keywords

Molecular Beam Epitaxy Saturated Calomel Electrode Ferromagnetic Layer Magnetotransport Property Texture Polycrystalline 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

Preview

Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.

References

  1. 1.
    M.N. Baibich, J.M. Broto, A. Fert, F. Nguyen Van Dau, F. Petroff, P. Etienne, G. Creuset, A. Friederich, and J. Chazelas: Phys. Rev. Lett. 61, 2472 (1988)CrossRefADSGoogle Scholar
  2. 2.
    S.S.P. Parkin, Z. G. Li, and D. J. Smith: Appl. Phys. Lett. 58, 2710 (1991)CrossRefADSGoogle Scholar
  3. 3.
    D. H. Mosca, F. Petroff, A. Fert, P. A. Schroeder, W. P. Pratt, Jr., and R. Laloee: J. Magn. Magn. Mater. 94, L1 (1991)CrossRefADSGoogle Scholar
  4. 4.
    F. Petroff, A. Barthelemy, A. Hamzic, A. Fert, P. Etienne, S. Lequen, and G. Creuzet: J. Magn. Magn. Mater. 93, 95 (1991)CrossRefADSGoogle Scholar
  5. 5.
    X. Bian, J. O. Ström-Olsen, Z. Altounian, Y. Huai, and R.W. Cochrane: Apply. Phys. Lett. 62, 3525 (1993).CrossRefADSGoogle Scholar
  6. 6.
    T. W. Jr. Barbee: In: Synthetic Modulated Structure, Edited by L. L. Chang and B. C. Giessen, Academic Press, London, 1985 p.313.Google Scholar
  7. 7.
    B. Y. Jin, and J. B. Ketterson: Advances in Physics. 38, 189 (1989).CrossRefADSGoogle Scholar
  8. 8.
    L. M. Falicov, D. T. Pierce, S.D. Bader, R. Gronsky, K. B. Hathaway, H. J. Hopster, D. N. Lambeth, S. S. P. Parkin, G. Prinz, M. Saloman, I. K. Schuller, and R. H. Victora: J. Mater. Reports, 5, 1299 (1990)CrossRefADSGoogle Scholar
  9. 9.
    H. J. de Wit: Rep. Prog. Phys., 55, 113 (1992)CrossRefADSGoogle Scholar
  10. 10.
    R. J. Highmore, W. C. Shih, R. E. Somekh, and J. E. Evetts: J. Magn. Magn. Mater., 116, 249, (1992)CrossRefADSGoogle Scholar
  11. 11.
    M. Naoe, N. Matsushita, and S. Nakagawa: J. Magn. Magn. Mater., 134, 395 (1994)CrossRefADSGoogle Scholar
  12. 12.
    H. Ibach, and H. Lüth: Solid State Physics, Springer-Verlag, Berlin, 1991, p. 324.Google Scholar
  13. 13.
    W. Blum: Trans. Amer. Electrochem. Soc. 40, 307 (1921)Google Scholar
  14. 14.
    A. Brenner: Electrodeposition of Alloys, (Academic Press, New York 1963)Google Scholar
  15. 15.
    J. Yahalom and O. Zadok: J. Mater. Sci. 22, 499 (1987)CrossRefADSGoogle Scholar
  16. 16.
    D.S. Lashmore and M. P. Dariel: J. Electrochem. Soc. 135, 1218 (1988)CrossRefGoogle Scholar
  17. 17.
    M. Alper, P. S. Aplin, K. Attenborough, D. J. Dingley, R. Hart, S.J. Lane, D.S. Lashmore, and W. Schwarzacher: J. Magn. Magn. Mater. 126, 8 (1993)CrossRefADSGoogle Scholar
  18. 18.
    M. Alper, K. Attenborough, R. Hart, S.J. Lane, D.S. Lashmore, C. Younes, and W. Schwarzacher: Appl. Phys. Lett. 63, 2144 (1993)CrossRefADSGoogle Scholar
  19. 19.
    A. P. O’Keeffe, O. I. Kasyutich, W. Schwarzacher, L. S. de Oliveria, and A. A. Pasa: Appl. Phys. Lett. 73, 1003 (1998)CrossRefGoogle Scholar
  20. 20.
    A. A. Pasa, and W. Schwarzacher: Phys. Stat. solid. (a), 173, 73 (1999)CrossRefADSGoogle Scholar
  21. 21.
    O.I. Kasyutich, W. Schwarzacher, V.M. Fedosyuk, P. A. Laskarzhevskiy, and A. I. Masliy: J. Electrochem. Soc. 147, 2964 (2000)CrossRefGoogle Scholar
  22. 22.
    S. Z. Hua, D. S. Lashmore, L. Salamanca-Riba, W. Schwarzacher, L. J. Schwarzendruber, R. D. McMichael, L. H. Bennett, and, R. Hart: J. Appl. Phys. 76, 6519 (1994)CrossRefADSGoogle Scholar
  23. 23.
    S.K.J. Lenczowski, C. Schonenberger, M.A.M. Gijs, and W.J.M. de Jonge: J.Magn. Magn. Mater. 148, 455 (1995)CrossRefADSGoogle Scholar
  24. 24.
    L. Peter, A. Cziraki, L. Pogany, Z. Kupay, I. Bakonyi, M. Uhlemann, M. Herrich, B. Arnold, T. Bauer, and K. Wetzig: J. Electrochem. Soc. 143, C168, (2001)CrossRefGoogle Scholar
  25. 25.
    I. Bakonyi, E. Toth-Kadar, T. Becsei, J. Toth, T. Tarnoczi, A. Cziraki, I. Gerocs, G. Nabiyouni, W. Schwarzacher: J. Magn. Magn. Mater. 156, 347 (1996)CrossRefADSGoogle Scholar
  26. 26.
    Y. Jyoko, S. Kashiwabara, and Y. Hayashi: J. Electrochem. Soc. 144, L5, (1997)CrossRefGoogle Scholar
  27. 27.
    P. Nallet, E. Chassaing, M.G. Walls, and M.J. Hytch: J. Appl. Phys. 79, 6884 (1996)CrossRefADSGoogle Scholar
  28. 28.
    E. Chassaing, A. Morrone, and J. E. Schmidt: J. Electrochem. Soc. 146, 1794 (1999)CrossRefGoogle Scholar
  29. 29.
    E. Chassaing, P. Nallet, and M.F. Trichet: J. Electrochem. Soc. 143, L99 (1996).CrossRefGoogle Scholar
  30. 30.
    K.D. Bird, and M. Schlesinger: J. Electrochem. Soc. 142, L65 (1995)CrossRefGoogle Scholar
  31. 31.
    V. M. Fedosyuk, O. I. Kasyutich, D. Ravinder, and H. J. Blythe: J. Magn. Magn. Mater. 156, 345 (1996)CrossRefADSGoogle Scholar
  32. 32.
    V. M. Fedosyuk, O. I. Kasyutich, and W. Schwarzacher: J. Magn. Magn. Mater. 198–199, 246 (1999)CrossRefGoogle Scholar
  33. 33.
    L. Piraux, J. M. George, J. F. Despres, C. Leroy, E. Ferain, R. Legras, K. Ounadjela, and A. Fert: Appl. Phys. Lett. 65, 2484 (1994)CrossRefADSGoogle Scholar
  34. 34.
    A. Blondel, J. P. Meier, B. Doudin, And J.-Ph. Ansermet: Appl. Phys. Lett. 65, 3019 (1994)CrossRefADSGoogle Scholar
  35. 35.
    P.R. Evans, G. Yi, and W. Schwarzacher: Appl. Phys. Lett. 76, 481 (2000)CrossRefADSGoogle Scholar
  36. 36.
    W. Schwarzacher, O.I. Kasyutich, P.R. Evans, M.G. Darbyshire, Ge Yi, V. M. Fedosyuk, F. Rousseaux, E. Cambril, and D. Decanini: J. Magn. Magn. Mater. 198–199, 185 (1999)CrossRefGoogle Scholar
  37. 37.
    S. Dubois C. Marchal, J. M. Beuken, L. Piraux, J. L. Duvail, A. Fert, J. M. George, and J. L. Maurice: Appl. Phys. Lett. 70, 396 (1997)CrossRefADSGoogle Scholar
  38. 38.
    M. A. M. Gijs, S. K. J. Lenczowski, and J. B. Giesbers: Phys. Rev Lett. 70, 3343 (1993)CrossRefADSGoogle Scholar
  39. 39.
    S. F. Lee, W. P. Pratt, R. Loloee, P. A. Schroeder, and J. Bass: Phys. Rev. B 46, 548 (1992)ADSGoogle Scholar
  40. 40.
    T. Valet, and A. Fert: Phys. Rev. B 48, 7099 (1993)ADSGoogle Scholar
  41. 41.
    C. A. Ross: Annu. Rev. Mater. Sci. 24, 159 (1994)CrossRefADSGoogle Scholar
  42. 42.
    W. Schwarzacher, and D.S. Lashmore: IEEE Trans. Magn. 32, 3133 (1996)CrossRefADSGoogle Scholar
  43. 43.
    A. Fert, and L. Piraux: J. Magn. Magn. Mater. 200, 338 (1999)CrossRefADSGoogle Scholar
  44. 44.
    A.J. Bard, and L.R. Faulkner: Electrochemical Methods, (John Wiley & Sons, New York 1980)Google Scholar
  45. 45.
    J. G. Wright: In: Epitaxial Growth Part A, Material Science Series, Edited J. W. Mattehews, (Academic Press, New York 1975)Google Scholar
  46. 46.
    L. M. Goldman, C. A. Ross, W. Ohashi, D. Wu, and F. Spaepen: Appl. Phys. Lett. 55, 2182 (1989)CrossRefADSGoogle Scholar
  47. 47.
    M. Alper: Electrodeposited Magnetic Superlattices. Ph. D. Thesis, University of Bristol, U.K. (1995)Google Scholar
  48. 48.
    M. Alper, W. Schwarzacher, S.J. Lane: J. Electrochem. Soc. 144, 2346 (1997)CrossRefGoogle Scholar
  49. 49.
    Y. Fujii: In: Metallic Superlattices, Studies in Physical and Theoretical Chemistry, edited by T. Shinjo and T. Takada, Vol. 49, (Elsevier, Amsterdam 1987)Google Scholar
  50. 50.
    E. E. Fullerton, I. K. Schuller, H. Vanderstraeten, and Y. Bruynseraede: Phys. Rev. B 45, 9292 (1992)ADSGoogle Scholar
  51. 51.
    T.P. Moffat: J. Electrochem. Soc. 142, 3767 (1995)CrossRefGoogle Scholar
  52. 52.
    L. J. Van der Pauw: Philips Res. Rep. 13, 1 (1958)Google Scholar
  53. 53.
    T. R. McGuire, and R. I. Potter: IEEE Trans. Magn., Mag-11(4), 1018 (1975)CrossRefADSGoogle Scholar
  54. 54.
    S. S. P. Parkin, R. F. Marks, R. F. C. Farrow, G. R. Harp, Q. H. Lam, and R. J. Savoy: Phys. Rev. B 46, 9262 (1992)ADSGoogle Scholar
  55. 55.
    M. Alper, K. Attenborough, V. Baryshev, R. Hart,, D.S. Lashmore, and W. Schwarzacher: J. Appl. Phys. 75, 6543 (1993)CrossRefADSGoogle Scholar

Copyright information

© Springer-Verlag Berlin Heidelberg 2002

Authors and Affiliations

  • Mürsel Alper
    • 1
  1. 1.Department of Physics, Science and Art FacultyUludag UniversityGörükle, BursaTurkey

Personalised recommendations