Abstract
This work investigates the fundamental growth of c-axis oriented piezoelectric AlN thin films by RF reactive sputtering on p-type (100) and (110) silicon substrates. Substrates are treated with a 1% HF solution before deposition to remove the native oxide followed by back-sputtering using argon ions. X-ray diffraction shows a (0001) oriented columnar texture of AlN grains which is the preferred orientation for piezoelectric applications. TEM shows the presence of a 4 nm thick semi-crystalline interface between silicon and the AlN layer. A basic growth mechanism is proposed from microstructural observations.
Access this chapter
Tax calculation will be finalised at checkout
Purchases are for personal use only
Preview
Unable to display preview. Download preview PDF.
References
Cheng C C, Chen Y C, Wang H J and Chen W R 1996 J. Vac. Sci. Technol. A 14, 2238
Hwang B H, Chen C S, Lu H Y and Hsu T C 2002 Mat. Sci. Eng. A 325, 380
Keim E G, Bijker M D and Lodder J C 2001 J. Vac. Sci. Technol. A 19, 1191
Keim E G, Nguyen L T, Lodder J C 2002 Proc. Microscopy & Microanalysis Meeting, (Quebec, Canada) p 1346CD
Naik R S, Reif R, Lutsky J J and Sodini C G 1996 J. Electrochem. Soc. 143, 691
Okano H, Takahashi T, Tanaka T, Shibata K and Nakano S 1992 Jap. J. Appl. Phys. 31, 3446
Stevens K S, Ohtani A, Kinniburgh M and Beresford R 1994 Appl. Phys. Lett. 65, 321
Author information
Authors and Affiliations
Editor information
Editors and Affiliations
Rights and permissions
Copyright information
© 2005 Springer-Verlag Berlin Heidelberg
About this paper
Cite this paper
Saravanan, S., Keim, E.G., Krijnen, G.J.M., Elwenspoek, M. (2005). Growth and surface characterization of piezoelectric AlN thin films on silicon (100) and (110) substrates. In: Cullis, A.G., Hutchison, J.L. (eds) Microscopy of Semiconducting Materials. Springer Proceedings in Physics, vol 107. Springer, Berlin, Heidelberg . https://doi.org/10.1007/3-540-31915-8_15
Download citation
DOI: https://doi.org/10.1007/3-540-31915-8_15
Publisher Name: Springer, Berlin, Heidelberg
Print ISBN: 978-3-540-31914-6
Online ISBN: 978-3-540-31915-3
eBook Packages: Physics and AstronomyPhysics and Astronomy (R0)