Conclusions
The target of this report was to summarize the similarities and dissimilarities of numerical simulation of high-resolution optical microscopy and optical lithography.
• Because of the higher numerical apertures on object side of microscopy for both detection and illumination, rigorous methods for the computation of object transmission are even more critical for microscopy than for lithography. This has practical consequences for the applicability of the Hopkins approximation which is for some mask structures feasible for lithography but unfeasible for high-NA illumination microscopy.
• On the image side, the vector effect can be neglected for microscopy but it has to be taken into account for lithography, where it degrades the TM-polarized contrast.
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Totzeck, M. (2006). Some similarities and dissimilarities of imaging simulation for optical microscopy and lithography. In: Osten, W. (eds) Fringe 2005. Springer, Berlin, Heidelberg. https://doi.org/10.1007/3-540-29303-5_36
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