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High Dielectric Constant Materials pp 253–286Cite as

Materials Issues for High-k Gate Dielectric Selection and Integration

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Part of the book series: Springer Series in Advanced Microelectronics ((MICROELECTR.,volume 16))

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Authors
  1. R.M. Wallace
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  2. G.D. Wilk
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  1. International SEMATECH, 2706 Montopolis Drive, Austin, TX, 78741, USA

    H.R. Huff

  2. Motorola, 3501 Ed Bluestein Boulevard, MD-K10, Austin, TX, 78721, USA

    D.C. Gilmer

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Wallace, R., Wilk, G. (2005). Materials Issues for High-k Gate Dielectric Selection and Integration. In: Huff, H., Gilmer, D. (eds) High Dielectric Constant Materials. Springer Series in Advanced Microelectronics, vol 16. Springer, Berlin, Heidelberg. https://doi.org/10.1007/3-540-26462-0_9

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