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Issues in Metal Gate Electrode Selection for Bulk CMOS Devices

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High Dielectric Constant Materials

Part of the book series: Springer Series in Advanced Microelectronics ((MICROELECTR.,volume 16))

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  1. V. Misra
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  1. International SEMATECH, 2706 Montopolis Drive, Austin, TX, 78741, USA

    H.R. Huff

  2. Motorola, 3501 Ed Bluestein Boulevard, MD-K10, Austin, TX, 78721, USA

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Misra, V. (2005). Issues in Metal Gate Electrode Selection for Bulk CMOS Devices. In: Huff, H., Gilmer, D. (eds) High Dielectric Constant Materials. Springer Series in Advanced Microelectronics, vol 16. Springer, Berlin, Heidelberg. https://doi.org/10.1007/3-540-26462-0_14

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