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Designed Block Copolymers for Ordered Polymeric Nanostructures

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Ordered Polymeric Nanostructures at Surfaces

Part of the book series: Advances in Polymer Science ((POLYMER,volume 200))

Abstract

Design concepts and strategies concerning the preparation of a variety of block copolymerarchitectures are presented. These aspects are discussed in relation to the self-organization ofnovel block copolymers on surfaces, utilizing a series of self-assembling processes, includingmicrophase separation, aggregation, amphiphilicity, crystallization, and liquid-crystal formation.

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Abbreviations

ABA:

Linear triblock copolymer

ABC:

Linear triblock terpolymer

AFM:

Atomic force microscopy

DMADPE:

1-(4-Dimethylaminophenyl)-1-phenylethylene

DMAPLi:

3-(Dimethylamino)propyl lithium

DTMAB:

Dodecyltrimethylammonium bromide

MMA:

Methyl methacrylate

MPPHM:

6-[4-(4-Methoxyphenyl)phenoxy]hexyl methacrylate

n-BuLi:

n-Butyl lithium

ODT:

Order–disorder transition

P2VP:

Poly(2-vinylpyridine)

PB:

Polybutadiene

PBO:

Poly(butylene oxide)

PCL:

Poly(ε-caprolactone)

PEO:

Poly(ethylene oxide)

PHEMA:

Poly(2-hydroxyethyl methacrylate)

PI:

Polyisoprene

PILi:

Polyisoprenyl lithium

PMMA:

Poly(methyl methacrylate)

PS:

Polystyrene

PSLi:

Polystyryl lithium

PtBMA:

Poly(tert-butyl methacrylate)

RI:

Refractive index

SAXS:

Small-angle X-ray scattering

s-BuLi:

Sec-Butyl lithium

SDS:

Sodium dodecylsulfate

SEC:

Size-exclusion chromatography

TEM:

Transmission electron microscopy

T g :

Glass transition

THF:

Tetrahydrofuran

UV:

Ultraviolet

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Correspondence to Nikos Hadjichristidis .

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G. Julius Vancso

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© 2006 Springer-Verlag Berlin Heidelberg

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Hadjichristidis, N., Pispas, S. (2006). Designed Block Copolymers for Ordered Polymeric Nanostructures. In: Vancso, G.J. (eds) Ordered Polymeric Nanostructures at Surfaces. Advances in Polymer Science, vol 200. Springer, Berlin, Heidelberg. https://doi.org/10.1007/12_069

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