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MOCVD Growth of Rare Earth Oxides:The Case of the Praseodymium/Oxygen System

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Rare Earth Oxide Thin Films

Part of the book series: Topics in Applied Physics ((TAP,volume 106))

Abstract

Chemical Vapor Deposition (CVD) uses one or more gaseous species (precursors) to form on a substrate, solid phase materials through an activated process. While today a large variety of precursors is known and rather complex deposition routes are involved, a user-friendly classification of precursor compounds as well as a viable discussion of their physical and chemical characteristics can be useful to MOCVD practitioners.

In this Chapter, an overview of both the exploitation and challenges of MOCVD fabrication of praseodymium oxides will be highlighted from different points of view, including the more suited precursors, the synthesis of thin films and their stability on silicon substrates.

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Authors and Affiliations

  1. CNR-IMM, Stradale Primosole 50, 95127, Catania, Italy

    Raffaella Lo Nigro

  2. Chemistry Department, University of Catania, Viale A. Doria 6, 95125, Catania, Italy

    Graziella Malandrino, Roberta G. Toro & Ignazio L. Fragalà

Authors
  1. Raffaella Lo Nigro
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  2. Graziella Malandrino
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  3. Roberta G. Toro
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  4. Ignazio L. Fragalà
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Marco Fanciulli Giovanna Scarel

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Nigro, R.L., Malandrino, G., Toro, R.G., Fragalà, I.L. MOCVD Growth of Rare Earth Oxides:The Case of the Praseodymium/Oxygen System. In: Fanciulli, M., Scarel, G. (eds) Rare Earth Oxide Thin Films. Topics in Applied Physics, vol 106. Springer, Berlin, Heidelberg . https://doi.org/10.1007/11499893_3

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