Abstract
This abstract is focused on the fabrication of low friction silicon micro guides. The novelty of this work is related to the fabrication process using an inductively coupled plasma etching and a barrel etching process for silicon micromachining. This simple technology allows the fabrication of silicon micro guides with only two photolithographic steps. Micro patterns on support structures of the stationary parts were fabricated to minimize the contacting area of the micro linear guide and as a result to reduce a sliding friction as well as a coefficient of friction.
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© 2007 Springer-Verlag London Limited
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Phataralaoha, A., Büttgenbach, S. (2007). Plasma Etching Based Processes for the Fabrication of Micro Structured Linear Guide. In: Towards Synthesis of Micro-/Nano-systems. Springer, London . https://doi.org/10.1007/1-84628-559-3_37
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DOI: https://doi.org/10.1007/1-84628-559-3_37
Publisher Name: Springer, London
Print ISBN: 978-1-84628-558-5
Online ISBN: 978-1-84628-559-2
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