Conclusions
Unless a dramatic improvement in the properties of low-Κ materials takes place, selective airgaps remain an attractive method for further decreasing the dielectric permittivity in future technology generations. Selective airgaps have the great advantage of being scalable, but their good electrical performance goes together with slightly higher leakage currents.
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Gueneau de Mussy, J.P., Beyer, G., Maex, K. (2005). Selective Airgaps: Towards a Scalable Low-k Solution. In: Zschech, E., Whelan, C., Mikolajick, T. (eds) Materials for Information Technology. Engineering Materials and Processes. Springer, London. https://doi.org/10.1007/1-84628-235-7_8
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