Conclusion
X-ray reflectivity is a very sensitive method to investigate thin-film and multilayer structures. The main parameters obtained are thickness, roughness, and layer density. Concerning the thickness range of application, it is well suited for many materials used in modern information technologies. It is a non-destructive technique, but due to the very low incidence angles of radiation it requires relatively large sample areas. Nevertheless, it is indispensable for the evaluation and monitoring of future thin film deposition techniques.
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Zaumseil, P. (2005). X-ray Reflectivity Characterisation of Thin-Film and Multilayer Structures. In: Zschech, E., Whelan, C., Mikolajick, T. (eds) Materials for Information Technology. Engineering Materials and Processes. Springer, London. https://doi.org/10.1007/1-84628-235-7_40
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DOI: https://doi.org/10.1007/1-84628-235-7_40
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