Abstract
The back-gate induced noise overshoot revealed in partially-depleted SOI nMOSFETs and pMOSFETs is described. It is shown that the Lorentzian noise is responsible for that overshoot. The parameters of such Lorentzians are measured for different back-gate and front-gate voltages including the case where the Electron-Valence-Band (EVB) tunneling occurs. A model is proposed that attributes the back-gate induced Lorentzian to the Nyquist noise of the body-source conductance. It is assumed that the accumulating back-gate voltage induces the p++-nāā junction near the back interface and its leakage current increases that conductance.
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Lukyanchikova, N., Garbar, N., Smolanka, A., Simoen, E., Claeys, C. (2005). Back-Gate Induced Noise Overshoot in Partially-Depleted SOI MOSFETs. In: Flandre, D., Nazarov, A.N., Hemment, P.L. (eds) Science and Technology of Semiconductor-On-Insulator Structures and Devices Operating in a Harsh Environment. NATO Science Series II: Mathematics, Physics and Chemistry, vol 185. Springer, Dordrecht. https://doi.org/10.1007/1-4020-3013-4_28
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DOI: https://doi.org/10.1007/1-4020-3013-4_28
Publisher Name: Springer, Dordrecht
Print ISBN: 978-1-4020-3011-6
Online ISBN: 978-1-4020-3013-0
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