Abstract
With SOI to be adapted as a mainstream technology in the forthcoming years, two issues are still of a critical interest regarding circuit applications: low frequency noise behavior and hot-carrier reliability, in state-of-the art SOI MOSFETs. Both are thoroughly investigated in this paper and a set of recent results in advanced CMOS SOI devices is given.
This is a preview of subscription content, log in via an institution.
Buying options
Tax calculation will be finalised at checkout
Purchases are for personal use only
Learn about institutional subscriptionsPreview
Unable to display preview. Download preview PDF.
References
A. K. Agarwal, M. C. Driver, M. H. Hanes, H. M. Hodgood, P. G. McMullin, H. C. Nathanson, T. W. O'Keeffe, T. J. Smith, J. R. Szedon and R. N. Thomas, "MICROX™ — An advanced silicon technology for microwave circuits up to X-band", in Proc. IEDM Tech. Dig., pp. 687–690, Dec. 91.
D. Eggert, P. Huebler, A. Huerrich, H. Kuerck, W. Budde and M. Vorwerk, “A SOI-RF-CMOS technology on high resistivity SIMOX substrates for microwave applications to 5 GHz”, IEEE Trans. on Electron Devices, vol. 44, no. 11, pp. 1981–1989, Nov. 97.
O. Rozeau, J. Jomaah, S. Haendler, J. Boussey, and F. Balestra, "SOI Technologies Overview for Low-Power Low-Voltage Radio-Frequency Applications", Analog Integrated Circuits and Signal Processing, 25, 2000, Kluwer Academic Publishers — Special issue of SOI.
C.W. Tsai et al., “Valence-band tunneling enhanced hot carrier degradation in ultra-thin oxide nMOSFETs”, IEDM Tech Digest, 2000.
B.W. Min et al., “Hot carrier enhanced gate current and its impact in short channel nMOSFET reliability with ultra-thin gate oxides”, IEDM Tech Digest, 2001.
E-X Zhao et al., “Worst case conditions for Hot-Carrier Induced Degradation of sub-100 nm Partially Depleted SOI MOSFETs”, 2001 IEEE SOI Conf., pp.121–122.
W-K Yeh et al., “Hot-carrier induced degradation on 0.1µm SOI CMOSFET”, 2002 IEEE SOI Conf., pp.107–108.
J. Chan et al, “Charge pumping study of hot-carrier induced degradation of sub-100 nm Partially Depleted SOI MOSFETs”, 2002 IEEE SOI Conf., pp.43–44.
S.-H. Renn et al., “Hot-carrier effect and reliable lifetime prediction in deep submicron N-and P-channel SOI MOSFET's”, IEEE Trans. El. Dev., Vol. 45, No11, pp. 2335–2342, Nov. 1998.
G. Ghibaudo, O. Roux, Ch. Nguyen-Duc, F. Balestra, and J. Brini, "Improved Analysis of Low Frequency Noise in Field-Effect MOS Transistors", phys. stat. sol. (a) 124, p. 571, 1991.
E. Simoen, U. Magnusson, Antonio L. P. Rotondaro and Cor Claeys, “The Kink-related excess low frequency noise in silicon-on-insulator MOST's”, IEEE Trans. Electron Devices., vol. 41, pp.330–339, March 1994.
Y.-C. Tseng, W.M. Huang, P.J. Welch, J.M. Ford, and J.C.S. Woo., "Empirical correlation between AC kink and low frequency noise overshoot in SOI MOSFETs", IEEE EDL, vol. 19, no 5, pp. 157–159, May 1998.
F. Dieudonné, S. Haendler, J. Jomaah, C. Raynaud, K. De Meyer, H. Van Meer, and F. Balestra' “Shrinking from 0.25 down to 0.12µm SOI CMOS technology node: a contribution to 1/f noise in Partially Depleted N-MOSFETs”, in Proc. 3rd European Workshop on Ultimate Integration of Silicon, Munich, March 2002, pp. 33–36.
F. Dieudonné et al., Gate-induced floating body effect excess noise in ultra-thin gate oxide Partially Depleted SOI MOSFETs, IEEE El. Dev. Lett., Vol. 23, No12, pp. 737–739, Dec. 2002.
W-C Lee and C. Hu, “Modeling CMOS tunneling currents through ultra-thin gate oxide due to conduction-and valence-band electron and hole tunneling” IEEE Trans. Electron Devices, vol. 48, pp. 1366–1373, July 2001.
J. Pretet, T. Matsumoto, T. Poiroux, S. Cristoloveanu, R. Gwoziecki, C. Raynaud, A. Roveda and H. Brut, “New mechanism of body charging in Partially Depleted SOI-MOSFETs with ultra-thin gate oxides”, in Proc. 32nd ESSDERC, Firenze, Italy, September 2002, pp. 515–518.
S.-H. Renn et al., “Hot-carrier effect and reliable lifetime prediction in deep submicron N-and P-channel SOI MOSFET's”, IEEE Trans. El. Dev., Vol. 45, No11, pp. 2335–2342, November 1998.
W-K Yeh et al., “Hot-carrier induced degradation on 0.1µm SOI CMOSFET”, 2002 IEEE SOI Conf., pp.107–108.
W. Lee and H. Hwang, “Hot carrier degradation for narrow width MOSFET with shallow trench isolation”, Mic. Relia., Vol. 40, pp. 49–56, 2000.
E. Li and S. Prasad, “Channel width dependence of NMOSFET hot carrier degradation”, IEEE Trans. El. Dev., Vol. 50, No6, pp. 1545–1548, June 2003.
A.L. McWhorter, Semiconductor Surface Physics, University of Pennsylvania Press, Philadelphia 1957.
Author information
Authors and Affiliations
Editor information
Editors and Affiliations
Rights and permissions
Copyright information
© 2005 Kluwer Academic Publishers
About this paper
Cite this paper
Jomaah, J., Balestra, F. (2005). Reliability and Electrical Fluctuations in Advanced SOI CMOS Devices. In: Flandre, D., Nazarov, A.N., Hemment, P.L. (eds) Science and Technology of Semiconductor-On-Insulator Structures and Devices Operating in a Harsh Environment. NATO Science Series II: Mathematics, Physics and Chemistry, vol 185. Springer, Dordrecht. https://doi.org/10.1007/1-4020-3013-4_12
Download citation
DOI: https://doi.org/10.1007/1-4020-3013-4_12
Publisher Name: Springer, Dordrecht
Print ISBN: 978-1-4020-3011-6
Online ISBN: 978-1-4020-3013-0
eBook Packages: EngineeringEngineering (R0)