Abstract
When the size of silicon is reduced towards the nanometer range, new properties emerge due to a dramatic change in bonding conditions, and due to electron and hole state quantization. Bulk silicon is characterized by diamond-type crystal structure, with sp 3-hybridization and 4-fold coordination. With decreasing size, silicon undergoes a phase change to a more close-packed atomic arrangement, which characterizes atomic and electronic structures of small Si clusters. In order to study size-dependent properties of silicon nanoparticles, we apply scanning tunneling microscopy (STM) and scanning tunneling spectroscopy (STS). For silicon clusters we determine the energy gap as a function of size. We show that pristine silicon particles show a major transition in their electronic properties at about 15 Å. We find that by vapor-condensation in UHV, silicon is also able to form quasi-one-dimensional structures. Nanowires with diameters from 3 nm to 7 nm, more than 100 nm long were produced. Considering the calculated free energies and band gaps for several possible wire structures we suggest that silicon nanowires tend to grow with a fullerene-type Si24-based core structure.
Access this chapter
Tax calculation will be finalised at checkout
Purchases are for personal use only
Preview
Unable to display preview. Download preview PDF.
References
M. Van Rossum, Mater. Sci. Eng. 20, 128 (1993).
F. A. Buot, Phys. Reports 234, 1 (1993).
K. F. Goser, C. Pacha, and M. L. Rossmann, Proc. IEEE 85, 558 (1997).
H. L. Hartnagel, R. Richter, and A. Grub, Electronics and Communications Engineering Journal 3, 119 (1991).
G. W. Bryant, Phys. Rev. B 40, 1620 (1989).
N. Blanc, P. Gueret, and R. Germann, Physica B 189, 135 (1993).
M. Lonfat, B. Marsen, and K. Sattler, Chem. Phys. Lett. 313, 539–543 (1999).
G. Chen, G. Klimeck, I. I. I. Goddard, and A. William, Phys. Rev. B 50, 8035 (1994).
T. A. Burr, A. A. Seraphin, and K. D. Kolenbrander, Phys. Rev. B 56, 4818 (1997).
Cluster Assembled Materials; Vol. 232, edited by K. Sattler (Trans. Tech. Publications, Zuerich, 1997).
B. Marsen and K. Sattler, Phys. Rev. B 60 (1999).
N. T. Bagraev, E. T. Chaikina, and A. M. Malyarenko, Solid-State Electron 42, 1199 (1998).
B. Li, D. Yu, and S.-L. Zhang, Phys. Rev. B 59, 1645 (1999).
V. Ng, H. Ahmed, and T. Shimada, Appl. Phys. Lett. 73, 972 (1998).
J. Westwater, D. P. Gosain, and S. Usui, Phys. Stat. Solidi A 165, 37 (1998).
M. F. Crommie, C. P. Lutz, and D. M. Eigler, Phys. Rev. B 48, 2851 (1993).
J. C. Phillips, J. Chem. Phys. 83, 3330 (1985).
S. Saito, S. Ohnishi, and S. Sugano, Phys. Rev. B 33, 7036 (1986).
K. Raghavachari, J. Chem. Phys. 84, 5672 (1986).
G. Pacchioni and J. Koutecky, J. Chem,. Phys. 84, 3301 (1986).
R. Biswas and D. R. Hamann, Phys. Rev. B. 36, 6434 (1987).
U. Roethlisberger, W. Andreoni, and M. Parrinello, Phys. Rev. Lett. 72, 665 (1994).
D. Tomanek and M. A. Schlueter, Phys. Rev. Lett. 56, 1055 (1986).
D. Tomanek and M. A. Schlueter, Phys. Rev. B 36, 1208 (1987).
K. Balasubramanian, Chem. Phys. Lett ,135, 283 (1987).
P. Ballone, W. Andreoni, R. Car, and M. Parrinello, Phys. Rev. Lett. 60, 271 (1988).
J. R. Chelikowsky, Phys. Rev. Lett. 60, 2669 (1988).
X. G. Gong, Phys. Rev. B 52, 14677 (1995).
K. M. Ho, A. A. Shvartsburg, B. Pan, Z.-Y. Lu, C.-Z. Wang, J. G. Wacker, J. L. Fye, and M. F. Jarrold, Nature 392, 582 (1998).
D. A. Jelski, B. L. Swift, and T. T. Rantala, J. Chem. Phys. 95, 8552 (1991).
E. Kaxiras and K. Jackson, Phys. Rev. Lett. 71, 727 (1993).
A. M. Mazzone, Phys. Rev. B 54, 5970 (1996).
J. R. Chelikowsky, K. Glassford, and J. C. Phillips, Phys. Rev. B 44, 1538 (1991).
M. F. Jarrold and V. A. Constant, Phys. Rev. Lett. 67, 2994 (1991).
K. Fuke, K. Tsukamoto, and F. Misaizu, J. Chem. Phys. 99, 7807 (1993).
H. Takagi, H. Ogawa, Y. Yamazaki, A. Ishizaki, and T. Nakagiri, Appl. Phys. Lett. 56, 2379 (1990).
L. T. Canham, Appl. Phys. Lett ,57, 1046 (1990).
L.-W. Wang and A. Zunger, J. Phys. Chem ,98, 2158 (1994).
H. Yorikawa, H. Uchida, and S. Muramatsu, J. Appl. Phys. 79, 3619 (1996).
A. Kux and M. B. Chorin, Phys. Rev. B 51, 17535 (1995).
M. Hirao and T. Uda, Surf. Sci. 306, 87 (1994).
L. E. Brus, P. F. Szajowski, W. L. Wilson, T. D. Harris, S. Schuppler, and P. H. Citrin, J. Am. Chem. Soc. 117, 2915 (1995).
L. N. Dinh, L. L. Chase, M. Balooch, W. J. Siekhaus, and F. Wooten, Phys. Rev. B 54, 5029 (1996).
S. S. Iyer and Y. H. Xie, Science 260, 40 (1993).
T. van Bimren, L. N. Dinh, L. L. Chase, W. J. Siekhaus, and L. J. Terminello, Phys. Rev. Lett. 80, 3803 (1998).
A. Sieck, D. Porezag, and K. Jackson, Phys. Rev. A 56, 4890 (1997).
E. Kaxiras, in Cluster Assembled Materials; Vol. 232, edited by K. Sattler (TransTech Publications, Zurich, 1996), p. 67.
P. Melinon, P. Keghelian, B. Prevel, A. Perez, G. Guiraud, J. LeBrusq, J. Lerme, M. Pellarin, and M. Broyer, J. Chem. Phys. 107, 10278 (1997).
J. A. Stroscio, R. M. Feenstra, and A. P. Fein, Phys. Rev. Lett. 57, 2579 (1986).
H. I. Liu, D. K. Biegelsen, F. A. Ponce, N. M. Johnson, and R. F. W. Pease, Appl. Phys. Lett. 64, 1383 (1994).
H. Namatsu, Y. Takahashi, M. Nagase, and K. Murase, J. Vac. Sci. Technol. B 13, 2166 (1995).
M. Gotza, B. Saint-Cricq, and P.-H. Jouneau, Microelectron. Eng. 27, 129 (1995).
A. G. Nassiopoulos, S. Grigoropoulos, and D. Papadimitriou, Thin Solid Films 297, 176 (1997).
Y. Shi, J. L. Liu, F. Wang, Y. Lu, R. Zhang, S. L. Gu, P. Han, L. Q. Hu, Y. D. Zheng, C. Y. Lin, and D. A. Du, J. Vac. Sci. Technol. A 14, 1194 (1996).
J. L. Liu, Y. Shi, and Y. D. Zheng, J. Vac. Sci. Technol. B 13, 2137 (1995).
A. M. Morales and C. M. Lieber, Science 279, 208 (1998).
J. J. P. Stewart, J. Comput. Chem. 10, 221 (1989).
Author information
Authors and Affiliations
Editor information
Editors and Affiliations
Rights and permissions
Copyright information
© 2001 Kluwer Academic / Plenum Publishers, New York
About this chapter
Cite this chapter
Sattler, K. (2001). Nanodots and Nanowires of Silicon. In: Morán-López, J.L. (eds) Physics of Low Dimensional Systems. Springer, Boston, MA. https://doi.org/10.1007/0-306-47111-6_20
Download citation
DOI: https://doi.org/10.1007/0-306-47111-6_20
Publisher Name: Springer, Boston, MA
Print ISBN: 978-1-4757-0571-3
Online ISBN: 978-0-306-47111-7
eBook Packages: Springer Book Archive