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Abstract

Mathematical models are developed to calculate the surface roughness of focused-ion-beam (FIB) sputtered surface. The surface roughness is the combination of the beam function and the material function. The beam function includes ion type, acceleration voltage, ion flux, intensity distribution, dwell time, etc; the material function includes the inherent material properties related to FIB micromachining. Surface of FIB sputtered (100) silicon was characterized using atomic force microscope. Reasonable agreement between the calculated and measured surface roughness was found.

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© 2002 Kluwer Academic Publishers

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Ali, M.Y., Hung, N.P., Yuan, S. (2002). Surface Roughness of FIB Sputtered Silicon. In: Inasaki, I. (eds) Initiatives of Precision Engineering at the Beginning of a Millennium. Springer, Boston, MA. https://doi.org/10.1007/0-306-47000-4_28

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  • DOI: https://doi.org/10.1007/0-306-47000-4_28

  • Publisher Name: Springer, Boston, MA

  • Print ISBN: 978-0-7923-7414-5

  • Online ISBN: 978-0-306-47000-4

  • eBook Packages: Springer Book Archive

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