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Depth Profiling Using Sputtering Methods

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Book cover Beam Effects, Surface Topography, and Depth Profiling in Surface Analysis

Part of the book series: Methods of Surface Characterization ((MOSC,volume 5))

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  1. H. W. Werner

    Present address: Technical University, Vienna, Austria

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  1. Department of Materials Analysis, Philips Research Laboratories, 5656, AA Eindhoven, The Netherlands

    H. W. Werner & P. R. Boudewijn

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  1. National Renewable Energy Laboratory, Golden, Colorado

    Alvin W. Czanderna

  2. Rutgers, The State University of New Jersey, Piscataway, New Jersey

    Theodore E. Madey

  3. National Institute of Standards and Technology, Gaithersburg, Maryland

    Cedric J. Powell

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Werner, H.W., Boudewijn, P.R. (2002). Depth Profiling Using Sputtering Methods. In: Czanderna, A.W., Madey, T.E., Powell, C.J. (eds) Beam Effects, Surface Topography, and Depth Profiling in Surface Analysis. Methods of Surface Characterization, vol 5. Springer, Boston, MA. https://doi.org/10.1007/0-306-46914-6_5

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