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Physical and Chemical Methods for Thin-Film Deposition and Epitaxial Growth

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Specimen Handling, Preparation, and Treatments in Surface Characterization

Part of the book series: Methods of Surface Characterization ((MOSC,volume 4))

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  1. Department of Electrical and Computer Engineering, Oregon State University, Corvallis, Oregon, 97331

    John R. Arthur

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Editors and Affiliations

  1. National Renewable Energy Laboratory, Golden, Colorado

    Alvin W. Czanderna

  2. National Institute of Standards and Technology, Gaithersburg, Maryland

    Cedric J. Powell

  3. Rutgers, The State University of New Jersey, Piscataway, New Jersey

    Theodore E. Madey

  4. Vanderbilt University, Nashville, Tennessee

    David M. Hercules

  5. University of Pittsburgh, Pittsburgh, Pennsylvania

    John T. Yates Jr.

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Arthur, J.R. (2002). Physical and Chemical Methods for Thin-Film Deposition and Epitaxial Growth. In: Czanderna, A.W., Powell, C.J., Madey, T.E., Hercules, D.M., Yates, J.T. (eds) Specimen Handling, Preparation, and Treatments in Surface Characterization. Methods of Surface Characterization, vol 4. Springer, Boston, MA. https://doi.org/10.1007/0-306-46913-8_8

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