Development of Thin-Film Transistors Using Liquid Silicon

  • Tatsuya Shimoda


In this chapter, several kinds of thin-film transistors (TFTs) from liquid silicon are introduced. The TFT, described in Sect. 10.1, came from our first published work related liquid silicon, which appeared just before the JST-ERATO project had started. We were able to show the feasibility of making poly-Si films from liquid silicon equivalent to the conventional counterparts, i.e., solid- and gas-based ones. The TFTs using liquid-processed poly-Si films as a channel exhibited as high performance as those using gas phase-deposited ones. In this work we also demonstrated ink-jet printing of a channel for a poly-Si TFT.

As the second example, we introduce the TFTs which have been developed by Professor Ishikawa’s group in Delft University of Technology under collaboration of our team. They applied their original technique called micro-Czochralski method for solution-processed TFTs and fabricated a single-grained TFT which exhibited a mobility as high as that of a typical MOS-FET. A single-grained TFT was also obtained on a plastic substrate. Those TFTs are described in Sect. 10.2. Subsequently they succeeded to fabricate a TFT via an ultralow temperature process by developing an elaborate solidification process of liquid silicon. That actually enabled them to make a TFT on paper. That is described in Sect. 10.3.


Cyclopentasilane (CPS) Ink-jet-printed TFT Low-temperature-processed poly-Si TFT (LTPS TFT) Single-grain (sg) Si TFT TFT on paper 


  1. 1.
    T. Shimoda, Y. Matsuki, M. Furusawa, T. Aoki, I. Yudasaka, H. Tanaka, H. Iwasawa, D. Wang, M. Miyasaka, Y. Takeuchi, Nature 440, 783 (2006)CrossRefGoogle Scholar
  2. 2.
    T. Sameshima, S. Usui, M. Sekiya, IEEE Electron. Device Lett. 7, 276 (1986)CrossRefGoogle Scholar
  3. 3.
    K. Kitahara, R. Yamazaki, T. Kurosawa, K. Nakajima, A. Moritani, Jpn. J. Appl. Phys. 41, 5055 (2002)CrossRefGoogle Scholar
  4. 4.
    C. Chatgilialoglu, A. Guerrini, M. Lucarini, G.F. Pedulli, P. Carrozza, G.D. Roit, V. Borzatta, V. Lucchini, Organometallics 17, 2169 (1998)CrossRefGoogle Scholar
  5. 5.
    T. Shimoda, S. Kanbe, H. Kobayashi, S. Seki, H. Kiguchi, I. Yudasaka, M. Kimura, S. Miyashita, R.H. Friend, J.H. Burroughes, C.R. Towns, SID Symp. Dig. Tech. Pap. 30, 376 (1999)CrossRefGoogle Scholar
  6. 6.
    M. Furusawa, T. Hashimoto, M. Ishida, T. Shimoda, H. Hasei, T. Hirai, H. Kiguchi, H. Aruga, M. Oda, N. Saito, H. Iwashige, N. Abe, S. Fukuta, K. Betsui, SID Symp. Dig. Tech. Pap. 33, 753 (2002)CrossRefGoogle Scholar
  7. 7.
    R. Ishihara, P.C. van der Wilt, B.D. van Dijk, A. Burtsev, J.W. Metselaar, C.I.M. Beenakker, Thin Solid Films 427, 77 (2003)CrossRefGoogle Scholar
  8. 8.
    J. Zhang, R. Ishihara, H. Takagishi, K.R.T. Shimoda, C.I.M. Beenakker, in 2011 International Electron Devices Meeting (2011), p. 14.5.1Google Scholar
  9. 9.
    J. Zhang, R. Ishihara, H. Takagishi, R. Kawajiri, T. Shimoda, C.I.M. Beenakker, in 2012 19th International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD) (2012), p. 309Google Scholar
  10. 10.
    R. Ishihara, P.C. van der Wilt, B.D. van Dijk, A. Burtsev, F.C. Voogt, G.J. Bertens, J.W. Metselaar, C.I.M. Beenakker, in Flat Panel Display Technology and Display Metrology II; Vol. 4295 (2001), p. 14Google Scholar
  11. 11.
    P.C.v.d. Wilt, B.D.v. Dijk, G.J. Bertens, R. Ishihara, C.I.M. Beenakker, Appl. Phys. Lett. 79, 1819 (2001)CrossRefGoogle Scholar
  12. 12.
    R. Ishihara, J. Zhang, M.v.d. Zwan, M. Trifunovic, H. Takagishi, T. Shimoda, SID Symp. Dig. Tech. Pap. 45, 439 (2014)CrossRefGoogle Scholar
  13. 13.
    A. Pecora, L. Maiolo, M. Cuscunà, D. Simeone, A. Minotti, L. Mariucci, G. Fortunato, Solid State Electron. 52, 348 (2008)CrossRefGoogle Scholar
  14. 14.
    Y. Soo Young, N. Young, P.J.v.d. Zaag, D. McCulloch, IEEE Electron. Device Lett. 24, 22 (2003)CrossRefGoogle Scholar
  15. 15.
    M. Trifunovic, T. Shimoda, R. Ishihara, Solution-processed polycrystalline silicon on paper. Appl. Phys. Lett. 106, 163502 (2015)CrossRefGoogle Scholar
  16. 16.
    Arjowiggins Creative Papers, in Powercoat HD Technical Data Sheet (2015)Google Scholar
  17. 17.
    M. Trifunovic, P.M. Sberna, T. Shimoda, R. Ishihara, npj Flex. Electron. 1, 12 (2017). CrossRefGoogle Scholar
  18. 18.
    K. Okamoto, M. Shinohara, T. Yamanishi, S. Miyazaki, M. Hirose, Appl. Surf. Sci. 79, 57 (1994)CrossRefGoogle Scholar
  19. 19.
    T. Masuda, Y. Matsuki, T. Shimoda, Thin Solid Films 520, 6603 (2012)CrossRefGoogle Scholar

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© Springer Nature Singapore Pte Ltd. 2019

Authors and Affiliations

  • Tatsuya Shimoda
    • 1
  1. 1.Japan Advanced Institute of Science and TechnologyNomiJapan

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